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New Data on Ion-Induced Modifications of Aqueous Dissolution of Silicates

Published online by Cambridge University Press:  25 February 2011

G. Della Mea
Affiliation:
GNSM-CNR Dipartimento di Fisica Universita di Padova, Italy
J.-C. Dran
Affiliation:
Laboratoire Rene Bernas-CNRS Orsay, France
J.-C. Petit
Affiliation:
DRDD/SESD/LECALT Fontenay-aux-Roses, France
G. Bezzon
Affiliation:
INFN Laboratori Nazionali di Legnaro and Dipartimento di Fisica Universita di Padova, Italy
C. Rossi-Alvarez
Affiliation:
INFN Laboratori Nazionali di Legnaro and Dipartimento di Fisica Universita di Padova, Italy
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Abstract

The ion-induced modifications of aqueous dissolution have been thoroughly investigated in several silicates (amorphous silica, quartz, soda-lime glass and albite) by applying depth profiling techniques (RBS and resonant nuclear reactions) for the characterization of leached surfaces. We show in particular that the H penetration after implantation and leaching is markedly increased when the ion dose exceeds a critical value comprised between 1013 and 1014 Pb.cm-2. This feature supports the radiation damage origin of the observed effects. Such experiments provide interesting clues about the aqueous dissolution of silicates and show that no important effect of α-decay is expected on the hydration of HLW glasses during disposal.

Type
Research Article
Copyright
Copyright © Materials Research Society 1984

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References

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