Crossref Citations
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Hajdu, C.
Fried, M.
and
Pászti, F.
1996.
Ion Beam Modification of Materials.
p.
828.
Published online by Cambridge University Press: 28 February 2011
An in situ method for determining the ion implantation dose necessary to make Si amorphous is developed and utilized. This method is based on measuring ion-implantation-induced in-plane stress. Measurements are carried out for various low energy ions implanted into thin p-type (100) Si. The doses necessary to make Si amorphous obtained by this method are in good agreement with previous data. This technique is sensitive, informative, quick, visual and nondestructive.