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Observation and Measurement of Atomic Scale Imperfections in Materials Using CBED+EBI/H

Published online by Cambridge University Press:  21 February 2011

Rodney A. Herring ,
John E. Bonevich ,
Takayoshi Tanji  and
Akira Tonomura
Rodney A. Herring
Affiliation:
Tonomura Electron Wavefront Project, ERATO, JRDC, P.O. Box 5, Hatoyama, Saitama 350-03, Japan
John E. Bonevich
Affiliation:
Tonomura Electron Wavefront Project, ERATO, JRDC, P.O. Box 5, Hatoyama, Saitama 350-03, Japan
Takayoshi Tanji
Affiliation:
Tonomura Electron Wavefront Project, ERATO, JRDC, P.O. Box 5, Hatoyama, Saitama 350-03, Japan
Akira Tonomura
Affiliation:
Tonomura Electron Wavefront Project, ERATO, JRDC, P.O. Box 5, Hatoyama, Saitama 350-03, Japan
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Abstract

A new method of electron interferometry/holography (CBED+EBI/H) has been realized which produces interference between convergent beam electron diffracted beams. An electron biprism placed between the diffracted beams compensates for their diffraction angle by an induced potential. When overlaid the diffracted beams interfere to produce an interferogram. Holography is possible due to coherency of the electron beam. Reconstruction of the hologram by standard methods enables the phase change around the defects to be measured. These methods are very easy to apply and examples are given for small defects and defect clusters in heavy-ion implanted Si.

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References

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