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On the Influence of Boron-Interstitial Complexes on Transient Enhanced Diffusion

Published online by Cambridge University Press:  10 February 2011

D. Stiebel ,
P. Pichler  and
H. Ryssel
D. Stiebel
Affiliation:
Fraunhofer-Institut für Integrierte Schaltungen, Bauelementetechnologie, Schottkystrasse 10, 91058 Erlangen, Germany
P. Pichler
Affiliation:
Fraunhofer-Institut für Integrierte Schaltungen, Bauelementetechnologie, Schottkystrasse 10, 91058 Erlangen, Germany
H. Ryssel
Affiliation:
Lehrstuhl für Elektronische Bauelemente, Universität Erlangen-Nürnberg, Cauerstrasse 6, 91058 Erlangen, Germany
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Abstract

We present new experimental results on the transient enhanced diffusion (TED) of boron after ion implantation. The investigation is focussed on effects that influence TED of shallow profiles in the absence of {311}-defects. Under these conditions, TED is mainly determined by the formation of boron-interstitial complexes (BIC). In addition, effects from the proximity of the surface become more and more important. Insight into the behavior of the dopant atoms is obtained by the comparison with simulations.

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