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Polyaniline Surface Morphology During The Doping Process Using Atomic Force Microscopy

Published online by Cambridge University Press:  16 February 2011

Leonard J. Buckley
Leonard J. Buckley*
Affiliation:
Naval Research Laboratory, Washington, DC; Jack Y. Josefowicz and Like Xie, University of Pennsylvania, Philadelphia, PA.
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Abstract

Chemically synthesized polyaniline films were studied during the doping and dedoping process by imaging the polymer surface using in-situ Atomic Force Microscopy (AFM). The polymer, which was initially in the base non-conducting form was doped using aqueous acidic solutions of both tosylic (pH=0.2) and HCl (pH of 0.2 and 1.0). Dedoping was accomplished by exposing the same doped polymer surface to NH4OH (pH=12) base solution. AFM images showed that it was necessary to cycle the polymer surface 3 times between acid and base before a reproducible surface morphology was established between the doped and dedoped states. For the case of doping with tosylic acid AFM images showed that the polyaniline surface was immediately roughened. In addition there appeared to be an increase in the size of surface channels and cracks. When doping with HC1 (pH=1.0), no change in surface morphology was observed; however, noticeable surface roughening occurred over 10 Minutes for the case of the lower pH=0.2 solution. The complex permittivity and DC conductivity was measured to estimate the level of protonation in the AFM samples.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 328: Symposium Q – Electrical, Optical, and Magnetic Properties of Organic Solid State Materials , 1993 , 197
Copyright
Copyright © Materials Research Society 1994

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References

REFERENCES

1. MacDiarmid, A.G., Chiang, J.C., Richter, A.F., and Epstein, A.J., Synth. Met., 18, 285 (1987).Google Scholar
2. Mizumoto, M., Namba, M., Nishimura, S., Miyadera, H., Koseki, M. and Kobayashi, Y., Synth. Met., 28, c639 (1989).Google Scholar
3. Genies, E.M., Lapkowski, M., Santier, C. and Vieil, E., Synth. Met., 18, 631 (1987).Google Scholar
4. Noufi, R., Nozik, A.J., White, J. and Warren, L.F., J. Electro. Chem. Soc., 129, 2261 (1982).Google Scholar
5. Paul, E.W., Ricco, A.J., and Wrighton, M.S., J. Phys. Chem., 89, 1441 (1985).Google Scholar
6. Yang, R., Evans, D.F., Christensen, L., and Hendrickson, W.A., J. Phys. Chem., 94, 6117 (1990).Google Scholar
7. Caple, G., Wheeler, B.L., Swift, R., Porter, T.L., and Jeffers, S., J. Phys. Chem., 94, 5639 (1990).Google Scholar
8. Mantovani, I.G., Warmack, R.J., Annis, B.K., MacDiarmid, A.G., and Scherr, E.J., Appl. Poly. Sci., 40, 1693 (1990).Google Scholar
9. Kim, Yeon-Taik, Yang, H., and Bard, A.J., J. Electrochem. Soc., 138, L71 (1991).Google Scholar
10. Porter, T.L., Lee, C.Y., Wheeler, B.L., and Caple, G., J. Vac. Sci. Technol., A 9, 1452 (1991).Google Scholar
11. Binning, G. et al., Europhys. Lett., 3, 1281 (1987);CrossRefGoogle Scholar
Albrecht, T.R. and Quate, C.F., J. Vac. Sci. Technol., A 6, 271 (1988).Google Scholar
12. Albrecht, T.R. and Quate, C.F., J. Appl. Phys., 62, 2599 (1987).Google Scholar
13. Albrecht, T.R. et al., J. Appl. Phys., 64, 1178 (1988).Google Scholar
14. See for example: a) Huang, W., Humphrey, B., MacDiarmid, A., J. Chem. Soc., Faraday Trans., 82, 2385 (1986);Google Scholar
b) MacDiarmid, A., Chiang, J., Richter, A., Synth. Met., 18, 285 (1987).Google Scholar
15. Digital Instruments, Santa Barbara, CA 93117Google Scholar
16. Meyer, G. and Amber, N.M., Appl. Phys. Lett., 53, 1045 (1988).Google Scholar
17. Buckley, L.J. and Dudeck, K.E., Synth. Met., 52, 353 (1992).Google Scholar
18. Pouget, J. et al., Macromolecules, 24, 779 (1991).Google Scholar