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Potential of Ultra-High Resolution and Low Voltage Sem for Dynamic Experiments

Published online by Cambridge University Press:  15 February 2011

E D Boyes
E D Boyes*
Affiliation:
DuPont Company, CR&D, PO Box 80356-383, Wilmington, DE 19880-0356, USA
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Abstract

A new generation of ultrahigh resolution scanning electron microscope (UHRSEM) is designed to explore the potential for higher resolution imaging and chemical microanalysis from more representative bulk samples. A <0.5nm probe at 30kV and <2.5nm at 1kV have been integrated with high sensitivity energy dispersive x-ray spectrometry (EDX) [1] and a high vacuum (<3×10−8mbar) heating stage (to >1000°C). The sensitivity of surface imaging is generally enhanced at low beam energies. With low voltages and digitally integrated fast scan techniques, conductive coating of an electrically non-conducting sample, such as a ceramic substrate, is no longer a pre-requisite for SEM, and this opens up new possibilities for minimally invasive dynamic in-situ experiments. This paper focuses on metal particle migration and sintering on a ceramic substrate.

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