Hostname: page-component-76c49bb84f-kjkt6 Total loading time: 0 Render date: 2025-07-13T08:12:10.434Z Has data issue: false hasContentIssue false
  • English
  • Français

Potential of Ultra-High Resolution and Low Voltage Sem for Dynamic Experiments

Published online by Cambridge University Press:  15 February 2011

E D Boyes
E D Boyes*
Affiliation:
DuPont Company, CR&D, PO Box 80356-383, Wilmington, DE 19880-0356, USA
Get access

Abstract

A new generation of ultrahigh resolution scanning electron microscope (UHRSEM) is designed to explore the potential for higher resolution imaging and chemical microanalysis from more representative bulk samples. A <0.5nm probe at 30kV and <2.5nm at 1kV have been integrated with high sensitivity energy dispersive x-ray spectrometry (EDX) [1] and a high vacuum (<3×10−8mbar) heating stage (to >1000°C). The sensitivity of surface imaging is generally enhanced at low beam energies. With low voltages and digitally integrated fast scan techniques, conductive coating of an electrically non-conducting sample, such as a ceramic substrate, is no longer a pre-requisite for SEM, and this opens up new possibilities for minimally invasive dynamic in-situ experiments. This paper focuses on metal particle migration and sintering on a ceramic substrate.

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable

References

1. Boyes, E D, Proceedings ICEM-13, Paris, (1994), 51 Google Scholar
2. Pease, R F W and Nixon, W C, J Scie Intr (1965) 104, 281 Google Scholar
3. Goldstein, J I et al, Scanning Electron Microscopy and X-ray Microanalysis, Plenum Press, New York & London, (1984), and ref 22, are excellent general referencesGoogle Scholar
4. Venables, J A, Ultramicroscopy (1980), 7, 51 Google Scholar
5. Ishikawa, Y et al, Surface Science (1983), 124, 87 Google Scholar
6. Dingley, D, SEM/1984, 2, 589 Google Scholar
7. Morin, P , P, Pltaval, M, Besnard, D and Fontaine, G, Phil Mag (1979), 40, 511 Google Scholar
8. Czernuszka, J, Long, N, Boyes, E and Hirsch, P, Phil Mag Letts, (1990), 62, 227 9.Google Scholar
9. Jagota, A, Boyes, E D and Bordia, R K, MRS Symposium Proceedings, Synthesis and Processing of Ceramics: Scientific Issues, (1991) Q7.2Google Scholar
10. Bethe, H, Handbuch der Physik, Springer, Berlin (1933)Google Scholar
11. Reimer, L and Tollkamp, C, Scanning (1980), 3, 35 Google Scholar
12. Dawson, P H, J Appl Phys (1966), 37, 3644 Google Scholar
13. Cazaux, J and Lehmede, P, J Electr Spectros Rel Phenom (1992), 59, 49 Google Scholar
14. Postek, M T and Keery, W J, Scanning (1991), 13, 404 Google Scholar
15. Crewe, A V, Eggenberger, D, Wall, J and Welter, L M, Rev Sci Instr (1968), 39, 576 Google Scholar
16. Crewe, A V, Ultramicroscopy, (1976), 1, 267 Google Scholar
17. Kamminga, W, Optik (1976), 45, 39 Google Scholar
18. Mueller, M (1991), private communicationGoogle Scholar
19. Noran Instruments IncGoogle Scholar
20. Kanaya, K and Okayama, S, J Phys D, Appl Phys, (1972), 5, 43 Google Scholar
21. Cliff, G and Lorimer, G W, J Microscopy (1975), 103, 203 Google Scholar
22. Reed, S J B, Electron Microprobe Analysis, Cambridge University Press (1975)Google Scholar
23. Gatan Inc, model 628-TaGoogle Scholar