Hostname: page-component-8448b6f56d-sxzjt Total loading time: 0 Render date: 2024-04-19T19:59:42.962Z Has data issue: false hasContentIssue false
  • English
  • Français

Precision Ion Polishing System -A New Instrument for TEM Specimen Preparation of Materials

Published online by Cambridge University Press:  21 February 2011

Reza Alani  and
Peter R. Swann
Reza Alani
Affiliation:
Gatan Inc., 6678 Owens Drive, Pleasanton, CA 94588.
Peter R. Swann
Affiliation:
Gatan Inc., 6678 Owens Drive, Pleasanton, CA 94588.
Get access

Abstract

The article describes the design, construction and performance of a new bench top instrument for high speed ion beam thinning and polishing of materials. In this system, the combination of very low angle ion milling and powerful ion guns has led to the rapid production of high quality TEM specimens. The main subassemblies are (1) a work chamber (2) gas control system (3) vacuum system and (4) electrical system. The work chamber consists of a pair of newly designed Penning type ion guns and Faraday cups to measure ion currents. The Whisperlok™ mechanism provides specimen rotation, pneumatically driven airlock for very fast specimen exchange and transmission/reflection illumination for specimen viewing. The ion guns are mounted to deliver a nominal, 4° milling angle on the specimen surface with precision alignment of ±2° about horizontal and vertical axes. The actual thinning is undertaken from one side using a single, post-type specimen holder which minimizes the specimen heating and contamination. The ion beam current of each gun can be individually optimized by varying the flow rate of the ionizing gas. The main chamber is evacuated by diaphragm and molecular drag pumps to produce a clean, dry vacuum in the 10−6 Torr range. The discharge and accelerating voltages required for the operation of each gun are provided by a dual high voltage power supply capable of delivering ion energies in the range; 1 keV to 6keV. TEM micrographs of typical ion polished specimens of semiconductors, metals, ceramics and composites are included to illustrate the performance of the instrument.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 254: Symposium W – Specimen Preparation for Transmission Electron Microscopy of Materials III , 1991 , 43
Copyright
Copyright © Materials Research Society 1992

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Alani, R. and Swann, P.R., in Workshop on Specimen Preparation for Transmission Electron Microscopy of Materials II, edited by R.M. Anderson, Mater. Res. Soc. Proc., 199, p.85 (1990)Google Scholar
2. Alani, R., in International Symposium on Electron Microscopy, (Proc. of 10th Anniv. of Chinese Electron Microscopy Society) edited by Kuo, K. and Yao, J. published by World Scientific Publishing Co. Pte. Ltd., p.461 (1990)Google Scholar
3. Alani, R. and Swann, P.R., in Proc. 49th. Annual Meeting of EMSA, edited; G.W. Bailey and E.L. Hall, San Francisco Press, p. 1104, (1991)Google Scholar
4. Humiston, H. L., Tracy, B. M. and Dass, L.A., in Workshop on Specimen Preparation for Transmission Electron Microscopy of Materials III, see this volume, edited by R.M. Anderson, Mater. Res. Soc. Proc.Google Scholar
5. Wall, M., in Proc. 26th. Annual Meeting of Microbeam Analysis, edited by S.G. Howitt, p.317, (1991)Google Scholar
6. Gatan Model 656 Dimple Grinder Brochure (1986)Google Scholar
7. Chemically assisted ion beam milling for the preparation of transmission electron microscope specimens. Swann, Peter R., US Patent 5,009,743, filed November 6, 1989.Google Scholar