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Preparation and properties of amorphous carbon oxynitrides a-CNxOy films made by a nitrogen radical sputter method and by the layer-by-layer method

Published online by Cambridge University Press:  21 March 2011

Yohko Naruse
Affiliation:
Department of Electrical Engineering, Gifu University, 1–1 Yanaido, Gifu, 501–1193, Japan
Shoji Nitta
Affiliation:
Department of Electrical Engineering, Gifu University, 1–1 Yanaido, Gifu, 501–1193, Japan
Hitoe Habuchi
Affiliation:
Department of Electrical and Computer Engineering, Gifu National College of Technology, Sinsei-cho, Motosu-gun, Gifu, 501–0495, Japan
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Abstract

We have tried to prepare amorphous carbon oxynitrides (a-CNxOy)films by the oxygen radical treatment (ORT) of amorphous carbon nitrides (a-CNx) and also by the layer-by-layer method. Properties of a-CNxOy films were studied with X-ray photoelectron spectroscopy (XPS), photothermal deflection spectroscopy (PDS), ultraviolet-visible (UV-VIS) optical transmittance spectra, Raman spectra and electron spin resonance (ESR). Oxygen radical affects to a-CNx by etching, termination of defects and oxidation. A-CNxOy films are interesting for the application to luminescent materials and also to low dielectric consta nt materials.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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References

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