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Present and Emerging Techniques for Materials Microanalysis

Published online by Cambridge University Press:  25 February 2011

C. R. Helms
C. R. Helms*
Affiliation:
Stanford Electronics Laboratories, Stanford University, Stanford, CA 94305
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Abstract

Although classical materials characterization methods have existed for many years, modern microanalytical techniques had their start just over twenty years ago. In this paper, I will discuss some of the common techniques available today including AES, XPS, or ESCA, RBS, SIMS, and EDAX. A comparison of the key capabilities and limitations will be given including sensitivity, spatial resolution, quantitative analysis, nondestructive testing, chemical state determination, and analysis speed. It is clear that the reason each of these techniques still exists as commercial instrumentation is that each provides a unique set of capabilities, but also a unique set of limitations. To become viable in the materials analysis arena, a new technique must offer a significant extension of the capabilities already available but not at the cost of too severe a set of limitations. Examples would be the development of tools that offer both high sensitivity with accurate quantitative analysis, or good spatial resolution with high sensitivity, or minimal damage but good spatial resolution, etc. A number of papers in this volume will describe the details of these emerging technologies which provide advances in these areas; and I will attempt here to put a number of these new developments in perspective with regard to the more commonplace techniques available.

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Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 69: Symposium D – Materials Characterization , 1986 , 3
Copyright
Copyright © Materials Research Society 1986

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References

1. Russell, P.E., this volume.Google Scholar
2. Methods of Surface Analysis, edited by Czanderna, A. W. (Elsevier Publishing, New York, 1975).Google Scholar
3. Characterization of Solid Surfaces, edited by Kane, P.F., Larrabee, G.B. (PIenum Press, New York, 1974).Google Scholar
4. Carlson, T.A., in Photoelectron and Auger Spectroscopy, (Plenum Press, New York, 1975).Google Scholar
5. Helms, C.R., J. Vac. Sci. Technol. 20, 948 (1982).Google Scholar
6. Electron and Ion Spectroscopy of Solids, edited by Ermans, L.F. (Plenum Press, New York, 1978).Google Scholar
7. Zinner, E., J. Electrochem. Soc. 130, 1990 (1983).Google Scholar
8. Werner, H.W., Surface and Interface Anal. 2, 56 (1980).Google Scholar
9. Feldman, L.C., Mayer, J.W., and Pieraux, S.T., Materials Analysis by Ion Channeling (Academic Press, New York, 1982).Google Scholar
10. Goldstein, J.I., Newbury, D.E., Echlin, P., Joy, D.C., Fiori, C., and Lifshin, E., Scanning Electron Microscopy and X-Ray Microanalyses (Plenum Press, New York, 1981).Google Scholar
11. Electron Spectroscopy: Theory, Techniques, Applications, edited by Brundle, C.R. and Baker, A.D. (Academic Press, New York, 1981).Google Scholar
12. Materials Characterization Using Ion Beams, edited by Thomas, J.P. and Cachard, A. (Plenum Press, New York, 1978).Google Scholar
13. Reuter, W. and Baglin, J.E.E., J. Vac. Sci. Technol. 18, 282 (1981).Google Scholar
14. Chang, C.C., J. Vac. Sci. Technol. 18, 276 (1981).Google Scholar
15. Evans, C.A., J. Anal. Chem. 44, 67A (1972).Google Scholar
16. Wittmaach, K., Nucl. Instrum. Methods 168, 343 (1980).Google Scholar
17. Wittmaach, K., Surf. Sci. 89, 668 (1979).Google Scholar
18. Nicolet, M.A., Mayer, J.W., and Mitchell, I.V., Science 177, 841 (1972).Google Scholar
19. Chu, W.K., Nicolet, M.A., Mayer, J.W., and Evans, C.A., J. Anal. Chem. 46, 2136 (1974).Google Scholar
20. Mayer, J.W. and Poate, J.M., Thin Films Interdiffusion and Reactions, edited by Poate, J.M., Til, K.N., and Mayer, J.W. (Wiley, New York, 1978).Google Scholar
21. Chu, W.K., Mayer, J.W., and Nicolet, M.A., Backscattering Spectrometry, (Academic, New York, 1978).Google Scholar
22. Becker, C.E., this volume.Google Scholar
23. Odom, R.W., Hitzman, C.J., this volume.Google Scholar
24. Todd, G. and Poppa, H., Thin Solid Films 57, 213 (1979).Google Scholar
25. Cook, C.F., Helms, C.R., and Fox, D.C., J. Vac. Sci. Technol. 17, 44 (1980).Google Scholar
26. Giles, M.D., Hoyt, J.L., and Gibbons, J.F., this volume.Google Scholar
27. Schwarz, S.A. and Helms, C.R., J. Vac. Sci. Technol. 16, 781 (1979); J.A. Cookson and F.D. Polling, Thin Solid Films 19, 381 (1973).Google Scholar
28. Taubenblatt, M.A. and Helms, C.R., J. Appl. Phys. 54, 2667 (1983).Google Scholar
29. Abdson, J.R. and Sigmon, T.W., this volume.Google Scholar
30. Thomas, S., J. Appl. Phys. 45, 161 (1974).Google Scholar
31. Hollinger, G. and Himpsel, F.J., J. Vac. Sci. Technol. A1, 640 (1983).Google Scholar