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Production of III-V Nanocrystals by Picosecond Pulsed Laser Ablation

Published online by Cambridge University Press:  15 February 2011

M. H. Wu ,
R. Mu ,
A. Ueda  and
D. O. Henderson
A. Ueda
Affiliation:
Department of Physics, Fisk University Nashville, TN 37208
D. O. Henderson
Affiliation:
Department of Physics, Fisk University Nashville, TN 37208
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Abstract

In As nanoparticles have been produced by picosecond pulsed laser ablation of bulk targets in the presence of an inert backing gas. Atomic force microscopy measurements show particles ranging in size from one to ten nm. Stoichiometry of the targets, determined by Rutherford backscattering measurements, are typically preserved within ten percent. Optical absorption and raman scattering data help confirm the crystalline, quantum confined nature of the nanoparticles.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 780: Symposium Y – Advanced Optical Processing of Materials , 2003 , Y3.2
Copyright
Copyright © Materials Research Society 2003

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References

references

1. Muramoto, J., Inmaruy, T, Nakata, Y., Okada, T. and Maeda, M., Appl. Phys. A69, 8239 (1999).Google Scholar
2. Patrone, L., Nelson, D., Safarov, V. I., Giorgio, S., Sentis, M. and Marine, W., Appl. Phys. A 69, 8217 (1999).Google Scholar
3.See, for example, Movtchan, L. A., Marine, W., Dreyfus, R. W., Le, H. C., Sentis, M. and Autric, M., Appl. Surf. Sci. 96-98, 251 (1996).Google Scholar
4. Dinh, L. N., Hayes, S. E., Wynne, A. E., Wall, M. A., Saw, C. K., Stuart, B. C., Balooch, M., Paravatsu, A. K. and Reimer, J. A., J. Mat. Sci. 37, 3953 (2002).Google Scholar
5. Wu, M. H., Mu, R., Ueda, A. and Henderson, D. O., Mat. Res. Soc. Symp. Proc. 638, F13.2.1 (2001).Google Scholar
6.“Handbook Series on Semiconductor Parameters” vol. 1, 2 edited by Levinstein, M., Rumyantsev, S. and Shur, M., World Scientific, London, 1996.Google Scholar
7. Abeles, B., Beers, D.S., Cody, G. D. and Dismukes, J. P., Phys. Rev. 125, 44 (1962).Google Scholar
8. Heitz, R., Born, H., Hoffmann, A., Bimberg, D., Mukhametzhanov, I. and Madhukar, A., Appl. Phys. 77, 3746 (2000).Google Scholar