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Proton NMR Spin-Lattice Relaxation Time Characterization of a-Si(H) Structure

Published online by Cambridge University Press:  15 February 2011

M. E. Lowry ,
R. G. Barnes ,
D. R. Torgeson  and
F. R. Jeffrey
M. E. Lowry
Affiliation:
Ames Laboratory-USDOE * and Department of Physics, Iowa State University, Ames, Iowa 50011
R. G. Barnes
Affiliation:
Ames Laboratory-USDOE * and Department of Physics, Iowa State University, Ames, Iowa 50011
D. R. Torgeson
Affiliation:
Ames Laboratory-USDOE * and Department of Physics, Iowa State University, Ames, Iowa 50011
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Abstract

NMR data are presented for reactively sputtered amorphous silicon-hydrogen alloys (a-Si(H)). Measured differences in two of the samples are attributed to two distinct morphologies: a mixed phase (monohydride and dihydride) and a purely monohydride composition. Features of the mixed phase morphology have been modeled. Room temperature, 35 MHz spin-lattice relaxation times are presented for a series of monohydride samples prepared with systematically varied sputtering parameters. A correlation of proton T1 with the density of ESR states tentatively is suggested.

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References

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