Hostname: page-component-8448b6f56d-m8qmq Total loading time: 0 Render date: 2024-04-23T06:17:40.091Z Has data issue: false hasContentIssue false

Radiofrequency Discharge Modeling

Published online by Cambridge University Press:  21 February 2011

J. P Boeuf
Affiliation:
Centre de Physique Atomique de Toulouse, CNRS, URA 277, Univ. P. Sabatier, 118, route de Narbonne, 31062 Toulouse, Cédex, FRANCE
Ph Belenguer
Affiliation:
Centre de Physique Atomique de Toulouse, CNRS, URA 277, Univ. P. Sabatier, 118, route de Narbonne, 31062 Toulouse, Cédex, FRANCE
J. Wang
Affiliation:
Electrical Engineering Dept, Tsinghua University, Beijing, People's Republic of China
Get access

Abstract

Selfconsistent fluid models of radiofrequency discharges in helium and silane are presented. The role of the sheath and plasma electric field in the electron energy gain and deposition mechanisms in both cases are discussed.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Graves, D. B. and Jensen, K. F., IEEE trans. Plasma Sc. PS–14, 78 (1986); D. B. Graves, J. Appl. Phys. 62, 88 (1987).Google Scholar
[2] Barnes, M. S., Cotler, T. J. and Elta, M. E., J. Appl. Phys. 61, 81 (1987).Google Scholar
[3] Richards, A. D., Thompson, B. E. and Sawin, H. H., Appl. Phys. Lett. 50, 492 (1987).Google Scholar
[4] Boeuf, J. P., Phys. Rev. A 36, 2782 (1987).Google Scholar
[5] Boeuf, J. P. and Ségur, P. in Interactions Plasmas Froids Matériaux, edited by Lejeune, C., (Les Editions de Physique, 1988), p. 113.Google Scholar
[6] Boeuf, J. P. and Belenguer, Ph., to appear in Non Equilibrium Processes in Partially Ionized Gases, NATO Advanced Study Institute, edited by Capitelli, M. and Bardsley, J. N., (Plenum Press, New York, 1989).Google Scholar
[7] Gottscho, R.A. and Gaebe, C.E., IEEE Trans. Plasma Science PS–14,92 (1986); R.A. Gottscho, Phys. Rev. A 36, 2233 (1987).Google Scholar
[8] Derouard, J., to appear in Non Equilibrium Processes in Partially Ionized Gases, NATO Advanced Study Institute, edited by Capitelli, M. and Bardsley, J. N., (Plenum Press, New York, 1989).Google Scholar
[9] Boswell, R. W. and Morey, I.J., Appl. Phys. Lett. 52, 21 (1988).Google Scholar
[10] Surrendra, M., Graves, D.B. and Morey, I.J., “Electron Heating in Low Pressure rf Glow Discharges”, to be published.Google Scholar
[11] Kitamori, K. and Tagashira, T., Proc. of the 9th ESCAMPIG, Lisbon, Portugal, Ed. Ferreira, C.M., (European Physical Society), p 277 (1988).Google Scholar
[12] Kushner, M. J., IEEE Trans. Plasma Sc. PS–14, 188 (1986).Google Scholar
[13] Boeuf, J.P. and Marode, E., J. Phys. D: Appl. Phys. 15, 2169 (1982).Google Scholar
[14] Phelps, A. V., Jelenkovic, B. M. and Pitchford, L. C., Phys. Rev. A 36, 5327 (1987).Google Scholar
[15] Belenguer, Ph. and Boeuf, J.P., “Transition between different regimes of RF glow discharge”, submitted Phys. Rev. A.Google Scholar
[16] Surendra, M., Graves, D.B. and Jellum, G.M., “Self-consistent models of DC glow discharges: treatment of fast electrons”, to be published (1989).Google Scholar
[17] Gottscho, R. A., Mitchell, A., Scheller, G.R., Schryer, N.L., Graves, D.B. and Boeuf, J. P., Proc. 7th Symp. Plasma Proc. Electrochem. Soc., Mathad, G.S., Schwartz, G.C. and Hess, D.W. Eds. 88–22, 1 (1988).Google Scholar
[18] Chatham, H. and Gallagher, A., J. Appl. Phys. 58, 159 (1985).Google Scholar
[19] Kushner, M., J. Appl. Phys. 63, 2532 (1988).Google Scholar
[20] Hayashi, M., Dry Process Symposium, Tokyo, V–7, 127 (1984).Google Scholar
[21] Hebner, G. A. and Verdeyen, J. T., IEEE Trans. Plasma Sci. PS14, 132 (1986); G. A. Hebner, J. T. Verdeyen, M.J. Kushner, J. Appl. Phys. 63, 2226 (1988).Google Scholar
[22] Chapman, B., Glow Discharge Processes, (John Wiley and Sons: New York, 1980).Google Scholar
[23] Popov, O. A. and Godyak, V. A., J. Appl. Phys. 57, 53 (1985).Google Scholar
[24] Levitskii, S. M., Sov. Phys. Tech. Phys. 2, 887 (1958).Google Scholar
[25] Godyak, V. A. and Kanneh, A. S., IEEE Trans. Plasma Sc. PS–14, 112 (1986).Google Scholar
[26] Raizer, Y.P. and Schneider, M.N., Sov. J. Plasma Phys. 13, 267 (1987).Google Scholar
[27] Perrin, J., Cabarrocas, P. Roca i, Allain, B. and Friedt, J.M., Jap. J. Appl. Phys. 2041 (1988).Google Scholar
[28] Flamm., D.L. and Donnelly, V.M., 1986, J. Appl. Phys. 59, 1052 Google Scholar
[29] Gogolides, E., Nicolai, J.P. and Sawin, H.H., J. Vac. Technol. Sci. A 7, 1001 (1989).Google Scholar