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A Resistless Process for the Production of Patterned, Vertically Aligned ZnO Nanowires.

  • Mikhail Ladanov (a1) (a2) (a3), Kranthi Kumar Elineni (a2), Manoj Ram (a2) (a3), Nathan D. Gallant (a2), Ashok Kumar (a2) (a3) and Garrett Matthews (a4)...
Abstract

ZnO nanostructures have attracted a great deal of interest because of their biocompatibility and outstanding optical and piezoelectric properties. Their uses are widely varying, including as the active element in sensors, solar cells, and nanogenerators. One of the major complications in device development is how to grow ZnO nanowires in well aligned and patterned films with predefined geometrical shape and aspect ratio. Controlled growth is required to achieve the optimal density of nanowires and to produce a defined geometric structure for incorporation in the device. In this work, we have presented a method by which vertically aligned ZnO nanowires could be grown in defined patterns on surfaces without the use of resists. We used a hydrothermal method to grow ZnO nanowires on a substrate through growth modifiers that was pre-patterned with a seeding solution by means of microcontact printing. This method produced vertically aligned ZnO nanowires of predefined size and shape with pattern resolution high enough for the production of rows of single nanowires. The nanowires were characterized by using scanning electron microscopy (SEM) and X-ray diffraction spectroscopy (XRD) techniques.

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  • EISSN: 1946-4274
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