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RF Aerosol Mist Plasma Deposition of Oxide Films

Published online by Cambridge University Press:  21 February 2011

J. A. A. Williams ,
C. Q. Shen ,
K. D. Vuong ,
E. Tenpas ,
R. A. Condrate Sr ,
D. H. Lee ,
H. Wang ,
J. Fagan ,
X. W. Wang  and
J. Stuckey
...Show all authors
J. A. A. Williams
Affiliation:
Alfred University, Alfred, New York 14802, Buffalo State College, Buffalo, New York 14222, SUNY Buffalo New York 14260
C. Q. Shen
Affiliation:
Alfred University, Alfred, New York 14802, Buffalo State College, Buffalo, New York 14222, SUNY Buffalo New York 14260
K. D. Vuong
Affiliation:
Alfred University, Alfred, New York 14802, Buffalo State College, Buffalo, New York 14222, SUNY Buffalo New York 14260
E. Tenpas
Affiliation:
Alfred University, Alfred, New York 14802, Buffalo State College, Buffalo, New York 14222, SUNY Buffalo New York 14260
R. A. Condrate Sr
Affiliation:
Alfred University, Alfred, New York 14802, Buffalo State College, Buffalo, New York 14222, SUNY Buffalo New York 14260
D. H. Lee
Affiliation:
Alfred University, Alfred, New York 14802, Buffalo State College, Buffalo, New York 14222, SUNY Buffalo New York 14260
H. Wang
Affiliation:
Alfred University, Alfred, New York 14802, Buffalo State College, Buffalo, New York 14222, SUNY Buffalo New York 14260
J. Fagan
Affiliation:
Alfred University, Alfred, New York 14802, Buffalo State College, Buffalo, New York 14222, SUNY Buffalo New York 14260
X. W. Wang
Affiliation:
Alfred University, Alfred, New York 14802, Buffalo State College, Buffalo, New York 14222, SUNY Buffalo New York 14260
J. Stuckey
Affiliation:
Alfred University, Alfred, New York 14802, Buffalo State College, Buffalo, New York 14222, SUNY Buffalo New York 14260
M. DeMarco
Affiliation:
Alfred University, Alfred, New York 14802, Buffalo State College, Buffalo, New York 14222, SUNY Buffalo New York 14260
W. Yu
Affiliation:
Alfred University, Alfred, New York 14802, Buffalo State College, Buffalo, New York 14222, SUNY Buffalo New York 14260
A. Petrou
Affiliation:
Alfred University, Alfred, New York 14802, Buffalo State College, Buffalo, New York 14222, SUNY Buffalo New York 14260
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Abstract

We report new results on nano-scaled oxide films deposited by an RF aerosol mist plasma technique: including indium tin oxide transparent conductive films; yttria stabilized zirconia, nickel iron oxide/YSZ cermet, and lanthanum strontium manganite for fuel cell applications; Bi2Sr2Ca2Cu3Ox superconductor films; gadolinium iron oxide for magnetic heat pumps; silicon oxide for protective coatings, etc. Since this deposition process occurs in an atmospheric environment, it has potential for large scale production. The maximum deposition rate is approximately 1 micrometer per minute per centimeter squared. Substrate temperatures were between 300°C and 900°C. Crystal sizes are analyzed by XRD (Shadow Programs). Some films were also characterized by resistance, optical(IR-UV-Vis transmission/reflection and FTIR) and Mössbauer measurements. Film morphology was found to be strongly dependent on deposition parameters. Controlling the deposition rate by altering solution concentration and mist feed rates, as well as altering plasma torch settings and substrate temperature allowed the formation of different film morphologies. Film density, thickness, and crystallite size could be controlled to obtain films of differing characteristics. This is advantageous to fuel cell depositions where a dense electrolyte as well as porous electrodes (anode and cathode) are required.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 355: Symposium B1 – Evolution of Thin-Film and Surface Structure and Morphology , 1994 , 563
Copyright
Copyright © Materials Research Society 1995

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References

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