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Self-Induced Repair: a New Concept in Chemical Microprocessing

Published online by Cambridge University Press:  25 February 2011

C. Julian Chen
C. Julian Chen*
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights, NY 10598, USA
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Abstract

Self-induced repair (SIR) is a new concept in chemical microfabrication of microelectronic interconnections. It is based on local chemical processes (deposition or etching) induced by certain local electrical phenomena at defect sites (Joule heat, concentration of electrical field or current density, etc.). It has been demonstrated on four types of defects: near-opens, small opens, near-shorts, and thin shorts. The example of the SIR of near opens, or constrictions in interconnections, is discussed in detail.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 204: Symposium E – Chemical Perspectives of Microelectronic Materials II , 1990 , 427
Copyright
Copyright © Materials Research Society 1991

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References

REFERENCES

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