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Sharp Silicon Nano-Needles Based on Boron Etch-Stop in TMAHSolutions

Published online by Cambridge University Press:  28 January 2011

Sheping Yan ,
Yang Xu ,
Junyi Yang ,
Huiquan Wang ,
Zhonghe Jin  and
Yuelin Wang
Sheping Yan
Affiliation:
Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China
Yang Xu
Affiliation:
Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China
Junyi Yang
Affiliation:
Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China
Huiquan Wang
Affiliation:
Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China
Zhonghe Jin
Affiliation:
Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China
Yuelin Wang
Affiliation:
Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China
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Abstract

Operations on biological living cells and molecular devices have drivenresearch towards implementation of high-aspect-ratio nano-needles. However,current nano-needle fabrication is complicated to control the sizes andangles. In this work, we develop a simple method to fabricate repeatable andintegrated circuit (IC)-compatible sharp silicon nano-needles based on boronetch-stop in tetramethyl ammonium hydroxide (TMAH) solutions, and the needleangles can be accurately controlled. An analytical model is proposed toefficiently predict the needle sizes and explain the etching evolution ofsilicon nano-needles.

Keywords

nanostructuremicroelectro-mechanical (MEMS)Si

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References

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