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A Silicon Nanopore Device for On-Chip Patch Clamp Measurements of Single Ion Channel Activity

Published online by Cambridge University Press:  04 February 2015

L. Plucinski ,
Y. Chen  and
G. L. Liu
L. Plucinski
Affiliation:
University of Illinois Department of Electrical and Computer Engineering, 306 N Wright St, Urbana, IL, 61801 , U.S.A. University of Illinois Micro and Nanotechnology Laboratory, 208 N Wright St, Urbana, IL, 61801, U.S.A.
Y. Chen
Affiliation:
University of Illinois Department of Electrical and Computer Engineering, 306 N Wright St, Urbana, IL, 61801 , U.S.A. University of Illinois Micro and Nanotechnology Laboratory, 208 N Wright St, Urbana, IL, 61801, U.S.A.
G. L. Liu
Affiliation:
University of Illinois Department of Electrical and Computer Engineering, 306 N Wright St, Urbana, IL, 61801 , U.S.A. University of Illinois Micro and Nanotechnology Laboratory, 208 N Wright St, Urbana, IL, 61801, U.S.A.
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Abstract

Here we present a novel silicon nanopore planar patch clamp chip for single ion channel screening. We fabricate our devices using a combination of KOH and metal-assisted etching. Electrical characterization shows that the shunt capacitance and access resistance are within the accepted ranges for single channel recordings. In order to test our devices, we cultured and differentiated human neuroblastoma SH-SY5Y cells on chip. We reliably obtained a high resistance seal to the cell membrane and report single ion channel activity recordings.

Keywords

nanostructurebiologicalelectrical properties

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Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1720: Symposium D – Materials and Concepts for Biomedical Sensing , 2014 , mrsf14-1720-d09-03
Copyright
Copyright © Materials Research Society 2015 

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References

REFERENCES

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