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Simultaneous Overall and Local Stress Analysis of Thin Metal Films by Light Scattering and Beam Deflection Measurements

Published online by Cambridge University Press:  15 February 2011

C. Kylner  and
L. Mattsson
C. Kylner
Affiliation:
Department of Physics II (Optics), Royal Institute of Technology, S-100 44 Stockholm, Sweden, carina@optics.kth.se Surface Evaluation Laboratory, Institute of Optical Research, S-100 44 Stockholm, Sweden.
L. Mattsson
Affiliation:
Surface Evaluation Laboratory, Institute of Optical Research, S-100 44 Stockholm, Sweden.
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Abstract

We have developed an optical instrument for real-time overall stress as well as local stress relaxation measurements. The physical principle of the instrument is based on the fact that when a sample is exposed to heating the overall film stress bends the substrate and hillocks, the evidence of the local stress relaxation, form on the surface. Early hillock formation can be observed in real-time with integrated scattering technique, but the overall stress can be readily observed by laser beam deflection. Our instrument integrates laser beam deflection and light scattering techniques to achieve simultaneous overall stress and local stress relaxation measurements. A stress study is presented for an aluminium thin film on a silicon substrate.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 436: Symposium CC – Thin Films Stresses and Mechanical Properties VI , 1996 , 257
Copyright
Copyright © Materials Research Society 1997

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