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Stress and Phase Transformation Phenomena in Oxide Films: Real-Time Spectroscopic Measurements

Published online by Cambridge University Press:  25 February 2011

Gregory J. Exarhos  and
Nancy J. Hess
Gregory J. Exarhos
Affiliation:
Pacific Northwest Laboratory, Richland, Washington 99352
Nancy J. Hess
Affiliation:
Pacific Northwest Laboratory, Richland, Washington 99352
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Abstract

In situ optical methods are reviewed for characterization of phase transformation processes and evaluation of residual stress in solution-deposited metastable oxide films. Such low density films most often are deposited as disordered phases making them prone to crystallization and attendant densification when subjected to increased temperature and/or applied pressure. Inherent stress imparted during film deposition and its evolution during the transformation are evaluated from phonon frequency shifts seen in Raman spectra (TiO2) or from changes in the laser-induced fluorescence emission spectra for films containing rare earth (Sm+3:Y3Al5O12) or transition metal (Cr+3 :Al2O3) dopants. The data in combination with measured increases in line intensities intrinsic to the evolving phase are used to follow crystallization processes in thin films. In general, film deposition parameters are found to influence the crystallite ingrowth kinetics and the magnitude of stress and stress relaxation in the film during the transformation. The utility of these methods to probe crystallization phenomena in oxide films will be addressed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 271: Symposium N – Better Ceramics Through Chemistry V , 1992 , 319
Copyright
Copyright © Materials Research Society 1992

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References

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