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Stress Limited Scaling of Ge2Sb2Te5

  • Robert Edward Simpson (a1), Milos Krbal (a2), Paul Fons (a3), Alex Kolobov (a4), Tomoya Uruga (a5), Hajime Tanida (a6) and Junji Tominaga (a7)...
Abstract
Abstract

The influence of stress on the phase change behaviour of Ge2Sb2Te5 encapsulated by ZnS-SiO2 and TiN is investigated using temperature dependent Extended X-ray Asbsorption Fines Structure and Ellipsometry to determine the crystallisation temperature. The encapsulation material surrounding the Ge2Sb2Te5 has an increasingly dominant effect on the material's ability to change phase and can cause a profound increase in its crystallization temperature. We have experimentally shown that the increased crystallization temperature originates from compressive stress exerted from the encapsulation material. By minimizing the stress we have maintained the bulk crystallization temperature in Ge2Sb2Te5 films just 2 nm thick.

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