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Structure Studies of Thin Amorphous Films by Synchrotron X-Ray Absorption and Analytical Electron Microscopy.

Published online by Cambridge University Press:  26 February 2011

S. M. Heald
Affiliation:
Metallurgy and Materials Science Division, Brookhaven National Laboratory, Upton, NY 11973.
J. Tafto
Affiliation:
Metallurgy and Materials Science Division, Brookhaven National Laboratory, Upton, NY 11973.
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Abstract

We combine the techniques of EXAFS and XANES using synchrotron x-rays, and the corresponding techniques using electron energy loss spectroscopy (EXELFS and ELNES) to characterize and study the local atomic arrangement in thin amorphous films. These probes are complementary in that x-rays are best suited for absorption edges above 3 keV and electron energy loss spectroscopy for low energy edges, and thus this combination is very useful for amorphous materials containing both low and high Z elements. We use in addition transmission electron microscopy, electron diffraction, and electron energy loss spectroscopy in the low energy loss region. Results from amorphous T1O2 and amorphous SnO2 made by reactive sputtering are presented.

Type
Articles
Copyright
Copyright © Materials Research Society 1987

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References

REFERENCES

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