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Study of Amorphous Silicon Nitride films by Brillouin Spectroscopy

Published online by Cambridge University Press:  16 February 2011

G. Carlotti
Affiliation:
Dipartimento di Fisica, Unità INFM, Università di Perugia, Via Pascoli, 06100 Perugia, Italy
G. Socino
Affiliation:
Dipartimento di Fisica, Unità INFM, Università di Perugia, Via Pascoli, 06100 Perugia, Italy
Hua Xia
Affiliation:
National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210008, P.R. China
Z.F. Li
Affiliation:
National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210008, P.R. China
Wei Zhang
Affiliation:
National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210008, P.R. China
X.X. Qu
Affiliation:
National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210008, P.R. China
K.J. Chen
Affiliation:
National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210008, P.R. China
X.K. Zhang
Affiliation:
National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210008, P.R. China
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Abstract

The elastic properties of hydrogenated silicon nitride (a-SiNx:H) films, with x=1, have been investigated by means of the Brillouin light scattering technique. The films were deposited on an opaque substrate (silicon) in order to improve the scattering efficiency from acoustic phonons in the film. Measurement of the frequency shift of Brillouin peaks relative to both the surface Rayleigh Mode and the longitudinal bulk waves enabled us to determine the two independent elastic constants c11 and c44.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

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