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Study of sputtered Hafnium oxide Films for Sensor Applications

Published online by Cambridge University Press:  01 February 2011

H. Grüger ,
C. Kunath ,
E. Kurth ,
S. Sorge  and
W. Pufe
H. Grüger
Affiliation:
Fraunhofer IPMS, Grenzstr. 28, 01109 Dresden, Germany
C. Kunath
Affiliation:
Fraunhofer IPMS, Grenzstr. 28, 01109 Dresden, Germany
E. Kurth
Affiliation:
Fraunhofer IPMS, Grenzstr. 28, 01109 Dresden, Germany
S. Sorge
Affiliation:
Fraunhofer IPMS, Grenzstr. 28, 01109 Dresden, Germany
W. Pufe
Affiliation:
Fraunhofer IPMS, Grenzstr. 28, 01109 Dresden, Germany
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Abstract

In this paper results of the deposition and annealing of hafnium oxide thin films are reported. Due to the sensor application in mind, thicknesses between 30 and 150 nm have been deposited by r.f. sputtering of a high purity oxide target. Annealing has an important influence on the layer structure, stress and application correlated properties. A detailed understanding of the layer preparation is necessary to adjust deposition and annealing. After deposition the layers are predominately amorphous, annealing leads to textured layers with monocline or orthorhombic phases.

Besides gas sensor applications optimized layers may serve as protective coating or combined with a second material to multi layer stacks as high reflective dielectric mirror.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 869: Symposium D – Materials, Integration and Technology for Monolithic Instruments , 2005 , D2.1
Copyright
Copyright © Materials Research Society 2005

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References

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