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Superhard Nanocomposite of Nitride Superlattices by Opposed-Cathode Unbalanced Magnetron Sputtering

Published online by Cambridge University Press:  25 February 2011

X. Chu
Affiliation:
Department of Materials Science and Engineering, Northwestern University, 2145 Sheridan Rd., Evanston, IL 60208
M. S. Wong
Affiliation:
BIRL, Northwestern University, 1801 Maple Ave., Evanston, IL 60201
W. D. Sproul
Affiliation:
BIRL, Northwestern University, 1801 Maple Ave., Evanston, IL 60201
S. A. Barnett
Affiliation:
Department of Materials Science and Engineering, Northwestern University, 2145 Sheridan Rd., Evanston, IL 60208
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Abstract

Nanocomposite films of polycrystalline nitride superlattices with nanometer grain size were deposited onto tool steel substrates by a one-step process using an opposed-cathode high-rate reactive unbalanced magnetron sputtering system. The superlattices are composed of alternating thin layers of different nitrides such as TiN/NbN and TiN/VN. The thicknesses of two neighboring layers were between 3 and 150 nm and were determined by the rotating speed of the substrate holder and the sputtering rate of the individual layer material. The films exhibited exceptional hardness as high as 5200 kgf/mm2 for TiN/NbN superlattice and 5 100 kgf/mm2 for TiN/VN superlattice. The hardnesses of the superlattice coatings were strongly dependent on several deposition parameters such as the superlattice period, the nitrogen partial pressure, and the substrate bias voltage. One of the possible mechanisms for the hardness enhancement is the effect of nanophase materials, which were created mainly by the influence of the artificially layered-structure and the low energy ion bombardment during film growth.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

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References

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