Skip to main content

Surface Treatment with UV-Excited Radicals for Highly-Reliable Gate Dielectrics

  • Takashi Ito (a1), Rinji Sugino (a1), Toshiro Nakanishi (a1), Satoshi Ohkubo (a1), Yasuyuki Tamura (a1) and Kanetake Takasaki (a1)...

The UV-excited chlorine radical treatment effectively removed trace metal contaminants from Si ans SiO2 surfaces. We have found that this is predomonantly attributed to reactions between metal and chlorine, and metal oxides and silicon chloride, respectively. The former process was subjected to identify a breakdown spot on a thin gate dielectric film. After dielectric breakdown, a silicon crystallized filament as small as a few nanometers in diameter was formed and was selectively etched with chlorine radicals revealing a successively-etched region of the Si substrate. Nonuniformities of native exides on silicon were also detected using the same method. Gettering and etching wi:h a poly Si layer showed a possibility to make a gate dielectric film damage free and contamination free. Densification of native oxides formed after conventional wet cleaning of silicon was made with UV-excited oxygen radicals. Electrical characteristics of gate dielectrics treated with UV-excited chlorine and oxygen radicals showed high reliability.

Hide All
(1) Ito, T., Ext.Abst. lnt.Symp.on Semicon.Mfg., 103 (1994)
(2) Nakanishi, T., Ohkubo, S., Tamura, Y., Sugino, R., Awaji, N., and Takasaki, K., The Physics and Chemistry of SiO2 and the Si–SiO2 Interface, 96–1, 316328 (1996)
(3) Ito, T., Sugino, R., and Sato, Y., Proc. 4th Int. Symp. ULSI Sci. Tech., 93–13, 163 (1993)
(4) Sugino, R., Okui, Y., Shigeno, M., Ohkubo, S., Takasaki, K., and Ito, T., Ext. Abst. Int. Symp. on Semicon.Mfg., 262 (1995)
(5) Sugino, R., Toda, Y., and Ito, T., (to be published in J. Electrochem. Soc.)
(6) Sugino, R., Nakanishi, T., Takasaki, K., and Ito, T., J. Electrochem. Soc., 143, 8, 2691 (1996)
(7) Yoshida, T., Miyazaki, S., and Hirose, M., Ext. Abst. lnt. Conf. SSDM, 539 (1996)
(8) Hasegawa, E., Akimoto, K., Tsukiji, M., Kubota, T., and Ishitani, A., Ext. Abst. lnt. Conf. SSDM, 86 (1993)
(9) Ito, T., Sugino, R., Watanabe, S., Nara, Y., and Sato, Y., Proc. 1st Symp. Semicon. Cleaning, ECS, 90–9 (1989)
(10) Harrori, T., Takase, K., Yamagishi, H., Sugino, R., Nara, Y., and Ito, T., Jpn. J. Appl. Phys. 28, L296 (1989)
(11) Aoyama, T., Yamazaki, T., and Ito, T., Appl.Phys.Lett., 61, 102 (1992)
Recommend this journal

Email your librarian or administrator to recommend adding this journal to your organisation's collection.

MRS Online Proceedings Library (OPL)
  • ISSN: -
  • EISSN: 1946-4274
  • URL: /core/journals/mrs-online-proceedings-library-archive
Please enter your name
Please enter a valid email address
Who would you like to send this to? *


Full text views

Total number of HTML views: 0
Total number of PDF views: 2 *
Loading metrics...

Abstract views

Total abstract views: 38 *
Loading metrics...

* Views captured on Cambridge Core between September 2016 - 18th March 2018. This data will be updated every 24 hours.