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Thermal Wave Analysis: A Tool for Non-Invasive Testing in Ion Beam Synthesis of Wide Band Gap Materials

Published online by Cambridge University Press:  15 February 2011

G. Teichert ,
L. Schleicher ,
Ch. Knedlik ,
M. Voelskov ,
W. Skorupa ,
R.A. Yankov  and
J. Pezoldt
G. Teichert
Affiliation:
MFPA Weimar, Amalienstraße 13, D-99423 Weimar, Germany
L. Schleicher
Affiliation:
TU Ilmenau, Institut für Werkstofftechnik, PF 100565, D-98684 Ilmenau, Germany
Ch. Knedlik
Affiliation:
TU Ilmenau, Institut für Werkstofftechnik, PF 100565, D-98684 Ilmenau, Germany
M. Voelskov
Affiliation:
Forschungszentrum Rossendorf e.V., Institut für lonenstrahlphysik und Materialforschung, PF 510119, D-01314 Dresden, Germany
W. Skorupa
Affiliation:
Forschungszentrum Rossendorf e.V., Institut für lonenstrahlphysik und Materialforschung, PF 510119, D-01314 Dresden, Germany
R.A. Yankov
Affiliation:
TU Ilmenau, Institut für Festkörperelektronik, PF 100565, D-98684 Ilmenau, Germany
J. Pezoldt
Affiliation:
TU Ilmenau, Institut für Festkörperelektronik, PF 100565, D-98684 Ilmenau, Germany
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Abstract

Photothermal methods provide a valuable complement to the destructive measurement techniques for the detection of the optimal process conditions in ion beam synthesis of wide band gap semiconductor compounds. In addition to their nondestructive and non contact qualities, they are highly sensitive to changes of thermophysical properties due to structural changes. Analyses have been carried out with (SiC)l-x(AIN)x compounds, formed by ion beam synthesis.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 540: Symposium N / Microstructural Processes in Irradiated Materials , 1998 , 103
Copyright
Copyright © Materials Research Society 1999

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