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Towards Alpha Radiation Detection in Aqueous Solution: VLSI Technology Development for Diamond-Silicon Hybrid Sensors

Published online by Cambridge University Press:  08 October 2015

C. Giese
Affiliation:
Fraunhofer Institute for applied solid states physics, Tullastrasse 72, 79115 Freiburg, Germany
G. Lewes-Malandrakis
Affiliation:
Fraunhofer Institute for applied solid states physics, Tullastrasse 72, 79115 Freiburg, Germany
J. de Sanoit
Affiliation:
CEA-LIST, Diamond Sensors Laboratory, F-91191 Gif-sur-Yvette, France
M. Pomorski
Affiliation:
CEA-LIST, Diamond Sensors Laboratory, F-91191 Gif-sur-Yvette, France
C. Nebel
Affiliation:
Fraunhofer Institute for applied solid states physics, Tullastrasse 72, 79115 Freiburg, Germany
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Abstract

In the presented work, we have developed VLSI technology processes for new prototype sensors based on the synthesis of boron doped nanocrystalline diamond (B-NCD) and silicon based commercial detectors. The process is based on commercial passivated implanted planar silicon (PIPS) devices of PD450 and CAM450 types (CANBERRA). A layer of B-NCD of several hundred nanometers thickness and boron concentration up to 1021 atoms/cm3 is grown on the SiOx passivation layer in an ellipsoidal plasma enhanced chemical vapor deposition (PECVD) reactor at temperatures from 520-750°C, in hydrogen atmosphere. . The diamond electrode is dry chemically structured and aluminum electrodes are realized before mounting in a three-fold housing for measurements in aqueous solution. The prototype sensors show an alpha spectroscopy resolution of 100 keV for 241Am electroprecipitated from liquid solution.

Type
Articles
Copyright
Copyright © Materials Research Society 2015 

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References

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