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Ultra-Soft X-Ray Absorption Spectroscopy: A Bulk and Surface Probe of Materials

Published online by Cambridge University Press:  15 February 2011

Daniel A. Fischer ,
Gary E. Mitchell ,
Benjamin M. Dekoven ,
Alvin T. Yeh ,
John L. Gland  and
Arnie R. Moodenbaugh
Daniel A. Fischer
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
Gary E. Mitchell
Affiliation:
The Dow Chemical Company, Midland, MI 48667
Benjamin M. Dekoven
Affiliation:
The Dow Chemical Company, Midland, MI 48667
Alvin T. Yeh
Affiliation:
The University of Michigan, Ann Arbor, MI 48109
John L. Gland
Affiliation:
The University of Michigan, Ann Arbor, MI 48109
Arnie R. Moodenbaugh
Affiliation:
Brookhaven National Laboratory, Upton, NY 11973
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Abstract

Direct comparisons between the surface and bulk of diverse materials can be made by simultaneous electron yield (5 nm depth sensitivity) and fluorescence yield (200 nm) ultra soft x-ray absorption spectroscopy measurements utilizing a rapid sample interchange apparatus. For example the orientations of functional groups have been characterized at and near the surface of a series of model polymeric materials highlighting the chemical and molecular sensitivity of ultra soft x-ray absorption spectroscopy. In addition we discuss a bulk sensitive use of fluorescence yield to non destructively study a buried metal polymer interface. A second bulk sensitive example is the use of fluorescence yield oxygen K near edge x-ray spectroscopy as a method to determine the hole state density of high Tc materials.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 307: Symposium L – Applications of Synchrotron Radiation Techniques to Materials Science , 1993 , 101
Copyright
Copyright © Materials Research Society 1993

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References

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