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Wafer Curvature and Flatness Measurements Using The Magicmirror (Makyoh) Method

Published online by Cambridge University Press:  15 February 2011

J. SzabÓ ,
Ferenc Riesz  and
B. SzentpÁli
J. SzabÓ
Affiliation:
Research Institute for Technical Physics of the Hungarian Academy of Sciences, P. O. Box 76, H-1325 Budapest, Hungary
B. SzentpÁli
Affiliation:
Research Institute for Technical Physics of the Hungarian Academy of Sciences, P. O. Box 76, H-1325 Budapest, Hungary
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Abstract

A new method is presented for the measurement of the radii of curvature R of semiconductor wafers using the magic-mirror (Makyoh) technique. A flat mirror is placed beneath the sample, thus a second, “contour” image of the sample is formed beside the Makyoh image. From the ratio of the two image sizes, R can be determined using a set of reference curved mirrors. Model calculations show good agreement with the results. Other examples of assessing of the flatness of semiconductor samples are presented as well.

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References

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