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When Interface Gets Rough…

Published online by Cambridge University Press:  03 September 2012

Toh-Ming Lu ,
Hong-Ning Yang  and
Gwo-Ching Wang
Toh-Ming Lu
Affiliation:
Dept. of Physics, Applied Physics, and Astronomy and Center for Integrated Electronics
Hong-Ning Yang
Affiliation:
Dept. of Physics, Applied Physics, and Astronomy Rensselaer Polytechnic Institute, Troy, NY 12180-3590, USA
Gwo-Ching Wang
Affiliation:
Dept. of Physics, Applied Physics, and Astronomy Rensselaer Polytechnic Institute, Troy, NY 12180-3590, USA
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Abstract

Interface roughness is one of the central features in many important thin film technologies. Roughness is a result of far from equilibrium dynamic growth process and is difficult to describe using conventional statistical mechanics. Recently a dynamic scaling hypothesis has been proposed to describe such a system in which both time and space scaling are considered simultaneously. This approach has generated tremendous interest, both theoretical and experimental, for scientists working in thin film growth/etching as well as many diverse fields. In this paper we shall discuss the origin of the formation of interface roughness, the difference between near equilibrium and far from equilibrium growth problems, the relevant parameters that are necessary to describe a rough interface, and the application of the self-affine scaling concept in growth problems. The experimental approaches to study rough interfaces and growth fronts using diffraction will be summarized. It is shown that there exist two types of dynamic scaling during growth, one with a stationary local slope and another one with a nonstationary local slope. Future directions in this new area of research are highlighted.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 367: Symposium P – Fractal Aspects of Materials , 1994 , 283
Copyright
Copyright © Materials Research Society 1995

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