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Perfectionism-related variations in error processing in a task with increased response selection complexity

Published online by Cambridge University Press:  11 January 2023

André Mattes*
Affiliation:
Department of Individual Differences and Psychological Assessment, University of Cologne, Cologne, Germany
Markus Mück
Affiliation:
Department of Individual Differences and Psychological Assessment, University of Cologne, Cologne, Germany
Jutta Stahl
Affiliation:
Department of Individual Differences and Psychological Assessment, University of Cologne, Cologne, Germany
*
Author for correspondence: André Mattes, Email: andre.mattes@uni-koeln.de
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Abstract

Perfectionists strive for a flawless performance because they are intrinsically motivated to set and achieve high goals (personal standards perfectionism; PSP) and/or because they are afraid to be negatively evaluated by others (evaluative concern perfectionism; ECP). We investigated the differential relationships of these perfectionism dimensions with performance, post-response adaptation, error processing (reflected by two components of the event-related potential: error/correct negativity – Ne/c; error/correct positivity – Pe/c) and error detection. In contrast to previous studies, we employed a task with increased response selection complexity providing more room for perfectionistic dispositions to manifest themselves. Although ECP was related to indicators of increased preoccupation with errors, high-EC perfectionists made more errors than low-EC perfectionists. This observation may be explained by insufficient early error processing as indicated by a reduced Ne/c effect and a lack of post-response adaptation. PSP had a moderating effect on the relationship between ECP and early error processing. Our results provide evidence that pure-EC perfectionists may spend many of their cognitive resources on error-related contents and worrying, leaving less capacity for cognitive control and thus producing a structural lack of error processing.

Information

Type
Empirical Paper
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted re-use, distribution and reproduction, provided the original article is properly cited.
Copyright
© The Author(s), 2023. Published by Cambridge University Press
Figure 0

Figure 1. (A) Stimulus-response assignment and (B) trial course. In the example, a percentage sign which is assigned to the right middle finger is the target, so pressing the button with the right middle finger would be the correct response.

Figure 1

Figure 2. Topographical maps for errors and correct responses in an interval of 0–150 ms following the response (left) and 150–300 ms following the response (right) and grand-average waveforms for errors and correct responses. The error/correct negativity was quantified as the peak amplitude in the area marked grey at FCz (left), and the error/correct positivity was quantified as the peak amplitude in the area marked grey at Cz (right).

Figure 2

Table 1. Descriptive statistics

Figure 3

Table 2. Results of the regression analyses for the signal detection and electrophysiological variables

Figure 4

Table 3. Results of the mixed-effects model analyses for behavioural and electrophysiological variables

Figure 5

Figure 3. Results regarding perfectionism dimensions. The dots indicate the observed values of PSP and ECP. The grey area in panels A and B represents the 95% confidence interval around the regression line. The grey area in panel C indicates the range of the moderator depicted on the x-axis for which the slope of Response Accuracy is significant. The colours in panel D indicate the value of the simple slope for Response Accuracy (“Acc. Effect”) for each combination of PSP and ECP. White represents insignificant slopes. More information on how panel D was generated is provided in the supplementary material.

Figure 6

Figure 4. Fitted grand-average waveforms (derived from mixed-effects models) at FCz for errors and correct responses for pure-EC perfectionists (upper left), mixed perfectionists (upper right), non-perfectionists (lower left), and pure-PS perfectionists (lower right). For illustrative purposes, the waveforms were low-pass filtered at 5 Hz. To obtain the waveforms, a separate mixed-effects model with response accuracy, PSP, ECP, and all possible interactions was computed for each time step. Next, each mixed-effects model was used to predict the amplitude for all possible combinations of response accuracy (error and correct), high PSP or ECP (i.e. mean plus one standard deviation) and low PSP or ECP (mean minus one standard deviation), resulting in the presented waveforms. For more details on the computation of the waveforms and for the corresponding waveforms at the Cz electrode site, see supplementary material.

Figure 7

Figure 5. Illustration of the avoidance hypothesis (upper panel) and the capacity hypothesis (lower panel). The avoidance hypothesis postulates that when ECP is high and personal standards perfectionism (PSP) is low (i.e. pure-EC perfectionists; upper left panel), error processing is avoided altogether. When PSP is high (i.e. mixed perfectionists; upper right panel), error processing might be attenuated or not impacted at all. The capacity hypothesis claims that when ECP is high and PSP is low (lower left panel), pure-EC perfectionists dispose of less capacities that could be allocated to error processing because parts of the cognitive capacities are captured by worrying. Furthermore, they are not intrinsically motivated to perform well. Hence, error processing is diminished. When ECP is high and PSP is also high (lower right panel), mixed perfectionists also dispose of less capacities. However, because they are intrinsically motivated to perform well, they reallocate resources to error processing in a compensatory effort, resulting in intensive error processing.

Supplementary material: PDF

Mattes et al. supplementary material

Mattes et al. supplementary material

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