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Dynamic UV microstereolithography

Published online by Cambridge University Press:  15 November 2002

S. Monneret ,
H. Le Gall ,
V. Badé ,
F. Devaux ,
A. Mosset  and
E. Lantz
S. Monneret*
Affiliation:
Département de Chimie Physique des Réactions, ENSIC, 1 rue Grandville, BP 451, 54001 Nancy Cedex, France
H. Le Gall
Affiliation:
Département de Chimie Physique des Réactions, ENSIC, 1 rue Grandville, BP 451, 54001 Nancy Cedex, France
V. Badé
Affiliation:
Département de Chimie Physique des Réactions, ENSIC, 1 rue Grandville, BP 451, 54001 Nancy Cedex, France
F. Devaux
Affiliation:
Laboratoire d'Optique P.M. Duffieux, Université de Franche-Comté, 25030 Besançon Cedex, France
A. Mosset
Affiliation:
Laboratoire d'Optique P.M. Duffieux, Université de Franche-Comté, 25030 Besançon Cedex, France
E. Lantz
Affiliation:
Laboratoire d'Optique P.M. Duffieux, Université de Franche-Comté, 25030 Besançon Cedex, France
*
serge.monneret@ensic.inpl-nancy.fr
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Abstract

A new process of microstereolithography to manufacture freeform solid three-dimensional micro-components with outer dimensions in the millimetre size range is presented. The process, based on the use of a liquid crystal display as a dynamic mask generator, works with conventional industrial UV-sensitive stereolithographic materials. The main innovation of the process consists in using the optical frequency up-conversion of images from the visible to the UV range in order to overcome the opacity of LCD's in the UV domain. 400 × 400 points up-converted images have been obtained to generate solid three-dimensional objects.

Keywords

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 20 , Issue 3: ACO: Action Coordonnée Optique , December 2002 , pp. 213 - 218
Copyright
© EDP Sciences, 2002

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