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Real-time wavelength calibration and multi-technique plasma diagnostics in discharge capillary

Published online by Cambridge University Press:  01 December 2025

Sahar Arjmand
Affiliation:
Istituto Nazionale di Fisica Nucleare – Laboratori Nazionali del Sud (INFN-LNS), Catania, Italy
Roberto Catalano
Affiliation:
Istituto Nazionale di Fisica Nucleare – Laboratori Nazionali del Sud (INFN-LNS), Catania, Italy
Demetrio Oliva
Affiliation:
Istituto Nazionale di Fisica Nucleare – Laboratori Nazionali del Sud (INFN-LNS), Catania, Italy
Antonino Amato
Affiliation:
Istituto Nazionale di Fisica Nucleare – Laboratori Nazionali del Sud (INFN-LNS), Catania, Italy
Carmelo Manna
Affiliation:
Istituto Nazionale di Fisica Nucleare – Laboratori Nazionali del Sud (INFN-LNS), Catania, Italy
Alfio Domenico Pappalardo
Affiliation:
Istituto Nazionale di Fisica Nucleare – Laboratori Nazionali del Sud (INFN-LNS), Catania, Italy
Jose Suarez
Affiliation:
Istituto Nazionale di Fisica Nucleare – Laboratori Nazionali del Sud (INFN-LNS), Catania, Italy
Giuseppe Antonio Pablo Cirrone*
Affiliation:
Istituto Nazionale di Fisica Nucleare – Laboratori Nazionali del Sud (INFN-LNS), Catania, Italy Centro Siciliano di Fisica Nucleare e Struttura della Materia (CSFNSM), Catania, Italy Dipartimento di fisica ed astronomia, Università di Catania, Catania, Italy
*
Corresponding author: Giuseppe Antonio Pablo Cirrone; Email: pablo.cirrone@lns.infn.it

Abstract

Plasma spectroscopy is a versatile tool for diagnosing key properties of plasmas, including those generated by discharges. It provides critical parameters-such as electron density and temperature-needed to optimize plasma sources for laser wakefield acceleration (LWFA). Stable, uniform plasma channels are essential to sustain GV/m wakefield and generate high-quality electron beams for advanced applications like radiation therapy (RT). Accurate spectral measurements require reliable wavelength calibration, as optical components can drift with environmental changes. In this study, atomic emission (AE) lamps-specifically mercury (Hg) and neon-argon (Ne-Ar) were utilized as reference light sources for wavelength calibration of a spectrometer system coupled to an intensified charge-coupled device (ICCD) camera. The known emission lines from these lamps ensured high-precision calibration across the relevant spectral range, facilitating accurate extraction of plasma parameters. This precise calibration enabled the determination of electron density and temperature through spectroscopic diagnostics, which are critical for understanding plasma behaviour. These measurements contribute to the development of gas-filled capillary discharge systems for LWFA and support the experimental objectives of the I-LUCE facility, dedicated to exploring laser-plasma interactions and advancing very high-energy electron beam (VHEE) applications. Monte Carlo (MC) simulations were conducted to assess the dose distribution of VHEE beams for RT applications.

Information

Type
Research Article
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (http://creativecommons.org/licenses/by/4.0), which permits unrestricted re-use, distribution and reproduction, provided the original article is properly cited.
Copyright
© The Author(s), 2025. Published by Cambridge University Press.
Figure 0

Table 1. Specification of the SpectraPro HRS-300 PI spectrograph

Figure 1

Figure 1. An example of detected spectral frame showing Ne-Ar emission lines in the 620–660 nm range.

Figure 2

Figure 2. Overlaid spectra from five intervals covering 400–710 nm.

Figure 3

Figure 3. Observed spectrum of calibration lamps, including Hg (blue) and Ar-Ne (red) from 5 intervals, showing the line output.

Figure 4

Figure 4. Deviation between known and measured wavelengths in Table 2.

Figure 5

Figure 5. Raw spectral data from 5 intervals showing identified emission lines (Figure 3) and their corresponding pixel positions. (a) Interval 1, (b) Interval 2, (c) Interval 3, (d) Interval 4, (e) Interval 5.

Figure 6

Figure 6. Linear regression of wavelengths versus pixel positions across three spectral intervals (1, 3, 4).

Figure 7

Table 2. Emission lines from Hg/Ne-Ar lamps across five intervals with pixel positions, known wavelengths, and measurement deviations

Figure 8

Figure 7. Experimental setup for plasma discharge system and OES diagnostics.

Figure 9

Figure 8. Comparison of Gaussian, Lorentzian, and Voigt line shapes for Hβ line (Ref. 14)(CC BY-SA 4.0).

Figure 10

Table 3. Goodness of fit for $\mathrm{H}_\beta$ profile. R2 and SSE values comparing Gaussian, Lorentzian, and Voigt fits to the $\mathrm{H}_\beta$ line

Figure 11

Figure 9. Retrieved electron density from Hα and $\mathrm{H}_\beta$ line as a function of time in a 3 cm length/1 mm diameter capillary (Ref. 2) (CC BY-SA 4.0).

Figure 12

Figure 10. Photon energy of $\mathrm{H}_\beta$ line with Lorentzian fit converted from Figure 8.

Figure 13

Table 4. Considered critical density (nc) for $\mathrm{H}_{\alpha}$ and $\mathrm{H}_{\beta}$ lines

Figure 14

Figure 11. Hα/Hβ ratio as a function of time. The dashed line marks the theoretical threshold value.

Figure 15

Table 5. Atomic parameters for $\mathrm{H}_\alpha$ and $\mathrm{H}_\beta$

Figure 16

Figure 12. Retrieved electron temperature from Hα/Hβ ratio.

Figure 17

Table 6. Correction factor ($\Delta E_{\infty}$) for $\mathrm{H}_\alpha$ and $\mathrm{H}_\beta$ lines as a function of time

Figure 18

Figure 13. Retrieved plasma electron temperatures, $T_e (\frac{O II}{O III} (H_{\alpha}))$ and $T_e (\frac{O II}{O III} (H_{\beta}))$, as a function of time in a 3 cm length/1 mm diameter capillary.

Figure 19

Figure 14. Illustration of the expected spectral lines for O II, O III, N II, N III, C II, and C III at an electron density of $5 \times 10^{17}\ \mathrm{cm}^{-3}$, with electron temperatures of 1 eV (top) and 2 eV (bottom), based on NIST database (Ref. 11).

Figure 20

Figure 15. 2D dose distribution of four electron beams (top), and line profile of four along the y axis of the dose distribution (bottom).