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A Compact Planar Magnetron Plasma Sputtering Device for TiO2 Deposition – ERRATUM

Published online by Cambridge University Press:  27 March 2014

Michelle Marie S. Villamayor ,
Kenta Doi ,
Edna Mae D. Cruz ,
Freya Gay J. Avenir ,
Motoi Wada  and
Henry J. Ramos

Abstract

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Type
Erratum
Information
MRS Online Proceedings Library (OPL) , Volume 1601: Symposium R – Photocatalysis , 2014 , e4
Copyright
Copyright © Materials Research Society 2014 

doi: 10.1557/opl.2013.1150, Published by Materials Research Society, 29 November 2013.

The article by Villamayor et al. was published with the incorrect volume number. The correct volume number is Volume 1601. The Materials Research Society and Cambridge University Press apologize to the authors for this error. The correct version of the article follows this notice.

References

Villamayor, Michelle Marie S., Doi, Kenta, Cruz, Edna Mae D., Avenir, Freya Gay J., Wada, Motoi and Ramos, Henry J. (2013). A Compact Planar Magnetron Plasma Sputtering Device for TiO2 Deposition. MRS Online Proceedings Library, 6786, jsapmrs-13–6786 doi:10.1557/opl.2013.1150.CrossRefGoogle Scholar