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Spectroscopic imaging in electron microscopy

Published online by Cambridge University Press:  13 January 2012

Stephen J. Pennycook
Affiliation:
Oak Ridge National Laboratory; pennycooksj@ornl.gov
Christian Colliex
Affiliation:
Université Paris Sud, Orsay (France); colliex@lps.u-psud.fr

Abstract

In the scanning transmission electron microscope, multiple signals can be simultaneously collected, including the transmitted and scattered electron signals (bright field and annular dark field or Z-contrast images), along with spectroscopic signals such as inelastically scattered electrons and emitted photons. In the last few years, the successful development of aberration correctors for the electron microscope has transformed the field of electron microscopy, opening up new possibilities for correlating structure to functionality. Aberration correction not only allows for enhanced structural resolution with incident probes into the sub-Ångstrom range, but can also provide greater probe currents to facilitate mapping of intrinsically weak spectroscopic signals at the nanoscale or even the atomic level. In this issue of MRS Bulletin, we illustrate the power of the new generation of electron microscopes with a combination of imaging and spectroscopy. We show the mapping of elemental distributions at atomic resolution and also the mapping of electronic and optical properties at unprecedented spatial resolution, with applications ranging from graphene to plasmonic nanostructures, and oxide interfaces to biology.

Information

Type
Introduction
Copyright
Copyright © Materials Research Society 2012
Figure 0

Figure 1. Schematic of the “data cube” obtained with spectroscopic imaging for the case of electron energy-loss spectroscopy, (left) scanning transmission electron microscope (STEM), (right) energy-filtered imaging in TEM. In the STEM, a line scan can be obtained by scanning in one dimension only (e.g., from A to B), with the energy loss data (E) being obtained in parallel. In the TEM, the spatial variation is obtained in parallel, while the energy loss is scanned in energy (e.g., from E1 to E2). (Adapted from Reference 4.)

Figure 1

Figure 2. (a–b) Example of an electron energy-loss spectroscopy line spectrum across a sequence of layers from Si to TiN in a gate stack incorporating a thin layer of HfO2. In (c), arrows from top to bottom identify an interface plasmon mode between Si and SiO2, the bandgap in SiO2, the bandgap in HfO2, and an interface mode between HfO2 and TiN. (Adapted from Reference 9.) Note: X0, probe position along the scan direction (distance in (c)).

Figure 2

Figure 3. Z-contrast image of monolayer boron nitride with superimposed model structure. The image was obtained on a Nion UltraSTEM instrument operating at 60 kV to avoid knock-on damage and has been processed to remove noise and probe tail effects. Atomic identities were assigned based on image intensity, and the model relaxed using density functional theory. Red, B; green, N; yellow, C; and blue, O. The B–N separation is 1.45 Å. (Reproduced with permission from Reference 33.)

Figure 3

Figure 4. Plot of probe current versus probe size before aberration correction (black) and after correction of aberrations up to third-order (blue, Cs) and fifth-order (red, C5). Green arrows highlight the increased current in the aberration corrected probe or the improved spatial resolution that can be obtained.

Figure 4

Figure 5. Spectroscopic imaging of GaAs in the 〈110〉 projection comparing the Z-contrast image to the Ga L and As L spectroscopic images, obtained on a Nion UltraSTEM with a fifth-order aberration corrector operating at 100 kV. Images are 64 x 64 pixels, with a collection time of 0.02 s/pixel and a beam current of approximately 100 pA, after noise reduction by principal component analysis.37 The Ga–As separation is 1.41 Å. Note: ADF, annular dark field. Reproduced with permission from Reference 61.

Figure 5

Figure 6. Low loss electron energy-loss spectroscopy imaging of the SrTiO3/(La,Sr)MnO3/BiFeO3 (STO/LSMO/BFO) interface. (a) Imaging area; (b) representative spectra (after Fourier-log deconvolution) of the three components showing distinctive signatures and features; and (c–f) results of the multiple least squares fit of the image using BFO, LSMO, and STO spectra from (b) two energy ranges. Maps of the fit coefficients are color coded red, blue, and green for BFO, LSMO, and STO, respectively. In the core-loss range (35 to 125 eV), (c) a map of the fit coefficients identifies the three different materials in the three separate regions (shown in red, blue, and green), and (d) the goodness of fit χ2 map shows minimal residual error. In the plasmonic range (5 to 35 eV), (e) the fit coefficient map correctly identifies the regions, but (f) the χ2 map indicates a region of BFO approximately 2 nm wide that shows a poor fit, indicating an anomaly in dielectric response. Thin lines denote interface positions taken from a simultaneously acquired dark field image. (Reproduced from Reference 27.)

Figure 6

Figure 7. Absorbed real colors by a single silver nanoplatelet (a triangular-shaped prism of about 70 nm in side length and 8 to 10 nm in thickness), as deduced from a surface plasmon resonance map. This map exhibits peaks in the visible and near-visible spectral domain centered at different positions: it shows that, if illuminated by a white light photon beam, the red will be mostly absorbed at the tip, the blue at the edge, and the purple in the center of the metallic nanostructure. (Image courtesy of J. Nelayah, LPS Orsay.)