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CRL optics and silicon drift detector for P06 Microprobe experiments at 35 keV

Published online by Cambridge University Press:  05 August 2020

Gerald Falkenberg*
Affiliation:
Deutsches Elektronen-Synchrotron DESY, Notkestr. 85, D-22603 Hamburg, Germany
Frank Seiboth
Affiliation:
Deutsches Elektronen-Synchrotron DESY, Notkestr. 85, D-22603 Hamburg, Germany
Frieder Koch
Affiliation:
Paul Scherrer Institute PSI, Forschungsstrasse 111, CH-5232 Villigen, Switzerland
Ken Vidar Falch
Affiliation:
Deutsches Elektronen-Synchrotron DESY, Notkestr. 85, D-22603 Hamburg, Germany
Andreas Schropp
Affiliation:
Deutsches Elektronen-Synchrotron DESY, Notkestr. 85, D-22603 Hamburg, Germany
Dennis Brückner
Affiliation:
Deutsches Elektronen-Synchrotron DESY, Notkestr. 85, D-22603 Hamburg, Germany
Jan Garrevoet
Affiliation:
Deutsches Elektronen-Synchrotron DESY, Notkestr. 85, D-22603 Hamburg, Germany
*
a)Author to whom correspondence should be addressed. Electronic mail: gerald.falkenberg@desy.de

Abstract

A provisional setup for X-ray microprobe experiments at 35 keV is described. It is based on compound refractive lenses (CRLs) for nanofocusing and a Vortex silicon drift detector with 2 mm sensor thickness for increased sensitivity at high energies. The Microprobe experiment (PETRA III) generally uses Kirkpatrick-Baez mirrors for submicrometer focusing in the energy range of 5–21 keV. However, various types of scanning X-ray microscopy experiments require higher excitation energies. The CRL optics were characterized by X-ray ptychography and X-ray fluorescence (XRF) knife edge scans on a siemens star pattern and showed beam sizes down to 110 nm. The performance of the new setup for microscopic X-ray diffraction (XRD)–XRF scanning X-ray microscopy measurements at 35 keV is demonstrated on a cross-section of a painting fragment.

Information

Type
Proceedings Paper
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted re-use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright
Copyright © The Author(s), 2020. Published by Cambridge University Press on behalf of International Centre for Diffraction Data
Figure 0

Figure 1. P06 Microprobe test setup for 35 keV operation. (left) The 35 keV X-ray beam is focused by 149 Be CRLs to the sample position. The wavefront is corrected by a phase plate-positioned downstream, close to the CRL box. (right) For micro-XRD measurements, the GaAs lambda detector is positioned close to the sample.

Figure 1

TABLE I. Absorption within the Si detector material of 0.5 and 2 mm thickness (calc. by XOP 2.4).

Figure 2

Figure 2. Characterization of the focused X-ray beam at 35 keV by ptychography and XRF edge scans on a siemens star test pattern. (a) and (b) show the caustic of the reconstructed beam with and without phase plate for aberration correction; (c) and (d) show the corresponding beam cross-section at the focus position. The size of the (incoherent) beam depends on the opening of the horizontal front-end slits. Edge scans across the edges of a siemens star pattern and their derivative are shown in (e) and (f).

Figure 3

TABLE II. Focal size and flux depend strongly on the opening of the front-end slits.

Figure 4

Figure 3. Spectra taken with Vortex EM 0.5 mm and Vortex 2 mm under comparable conditions. (a) Multielement standard AXO RF17 15C10 and (b) clean thick silicon (“blank”).

Figure 5

Figure 4. XRD–XRF scan on a painting cross-section: scan area 150 × 30 μm2, 1 μm steps, and 6 s dwelltime.