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Study of the Hall-Petch Dependence in an Annealed Nanocrystalline Iron Thin Film

Published online by Cambridge University Press:  15 February 2011

J. B. Savader ,
M. R. Scanlon ,
R. C. Cammarata ,
D. T. Smith  and
C. Hayzelden
J. B. Savader
Affiliation:
The Johns Hopkins University, Department of Materials Science and Engineering, Baltimore, MD 21218, USA
M. R. Scanlon
Affiliation:
The Johns Hopkins University, Department of Materials Science and Engineering, Baltimore, MD 21218, USA Current Address: Rochester Institute of Technology, Rochester, NY 14623, USA
R. C. Cammarata
Affiliation:
The Johns Hopkins University, Department of Materials Science and Engineering, Baltimore, MD 21218, USA
D. T. Smith
Affiliation:
National Institute of Standards and Technology, Ceramics Division, Gaithersburg, MD 20899, USA
C. Hayzelden
Affiliation:
Harvard University, Division of Applied Sciences, Cambridge, MA 02138, USA
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Abstract

The hardness dependence on grain size of a nanocrystalline iron thin film prepared by sputtering was investigated. The as-deposited film had an initial grain size of 11.4 nm and sections of the film were annealed in a reducing atmosphere furnace to increase the grain size up to 31.5 nm. Hardness was measured by nanoindentation for different grain sizes, and a Hall-Petch plot of hardness versus reciprocal square root of grain size was obtained. This Hall-Petch plot gave a positive slope that was about a factor of seven smaller than the slope obtained from ball-milled iron with grain sizes between 6.0 and 8.5 nm [8].

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