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Materials characterization and the evolution of materials

Published online by Cambridge University Press:  27 November 2015

J.O. Cross
Affiliation:
Argonne National Laboratory, USA; jox@anl.gov
R.L. Opila
Affiliation:
Departments of Materials Science and Engineering, Chemistry and Biochemistry, Electrical and Computer Engineering, University of Delaware, USA; opila@udel.edu
I.W. Boyd
Affiliation:
Brunel University London, UK; ian.boyd@brunel.ac.uk
E.N. Kaufmann
Affiliation:
Argonne National Laboratory, USA; eltonk@anl.gov

Abstract

The materials characterization universe is as large and multifaceted as the materials and engineering fields combined. Many methods have evolved over decades, or even centuries, from quite rudimentary tools to extremely sophisticated instruments. Measurement and testing of materials span properties from mechanical, to electrical, to thermal; materials classes from metals, to semiconductors, to insulators, with ceramics, polymers, and composites somewhere in between; scales from atomic through nano-, micro-, meso-, and macroscopic; and times spanning picoseconds to years in practice, to eons in simulation. The technical context of a materials measurement ranges from fundamental science, often with no immediately transparent connection, to future engineering applications, to quite practical “real-world” field tests that can predict performance and—one hopes—prevent component failure. Materials measurement methods have grown out of distinct disciplinary homes: physics, chemistry, metallurgy, and, more recently, biology and environmental science. Drawing from the broad expanse of materials characterization techniques, we offer a perspective on that breadth and cite examples that are illustrative of the crucial role such techniques have played and are playing in the technologies of today.

Information

Type
Research Article
Copyright
Copyright © Materials Research Society 2015 
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Figure 1. Traditional materials science tetrahedron, illustrating how a material’s properties, processing, performance, and structure are interrelated. The version shown here inserts a central characterization node to emphasize that all four of these elements rely on that central capability. Figure obtained from Wikimedia Commons.

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Figure 2. In 1990, a scanning tunneling microscope was used to write the IBM logo in xenon atoms at 4 K on the (110) surface of a nickel single crystal. Each letter is 50 Å tall. Image licensed under Fair Use through Wikipedia.

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Figure 3. Profilometer measurement of machining marks in a 1.4 mm × 1.0 mm blank of a proprietary material. The instrument can measure 1.4-μm peak-to-valley grooves with a lateral resolution of 2.1 μm. Image courtesy of Zygo Corp.

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Figure 4. Focused-ion-beam scanning electron microscopy (FIB/SEM) can be included in the semiconductor fabrication process to characterize some wafers at particular processing steps. Note: CVD, chemical vapor deposition; PVD, physical vapor deposition; QA, quality assurance; QC, quality control.

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Figure 5. Microstructure in copper deposition sectioned and imaged with an Auriga 60 FIB/SEM instrument (Carl Zeiss, Oberkochen, Germany).

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Figure 6. (a–b) X-ray images from (a) Al–12 at.% Cu82 and (b) Al–9.8 wt% Si83 alloys during directional solidification at a controlled temperature gradient G and growth velocity V and (c–d) corresponding dendritic needle network (DNN) simulations at the same length scale. The primary dendrite arm spacing predictions are in agreement with the experiments. The color map represents the reduced solute field u = (ccl0)/[(1 – k)cl0], where c is the local solute concentration, cl0 is the equilibrium liquid concentration at the alloy solidus temperature, and k is the solute partition coefficient at the interface.

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Figure 7. Comparison of relative sensitivity as a function of depth between (left) a laboratory x-ray source with an x-ray energy of about 1.5 keV and (right) a synchrotron source with an x-ray energy of 5 keV. Note: XPS, x-ray photoelectron spectroscopy.

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Figure 8. Simple metal oxide semiconductor structure with two interfacial layers, IL-1 and IL-2, that might have formed between the intentionally deposited layers as a result of subsequent processing.

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Figure 9. Hard x-ray photoemission spectroscopy silicon 1s core-level spectra taken at four different beamline photon energies for (a) uncapped and (b) capped layer stacks. X-ray photoelectron spectroscopy peak intensities have been normalized relative to the main silicon–silicon peak at 1839.5 eV to emphasize the dependence of the intensity of the photoelectron peaks on the incident photon beam energy. Satellite peaks at higher binding energies arise from electrons bound to species more electronegative than silicon. The vertical dashed lines reveal the shift in binding energy described in the text.85