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Optical Properties of GaNAs Grown by MBE

Published online by Cambridge University Press:  13 June 2014

G. Pozina
Affiliation:
Department of Physics and Measurement Technology, Linköping University
I. G. Ivanov
Affiliation:
Department of Physics and Measurement Technology, Linköping University
B. Monemar
Affiliation:
Department of Physics and Measurement Technology, Linköping University
J.V. Thordson
Affiliation:
Chalmers University of Technology University of Göteborg, Sweden
T.G. Andersson
Affiliation:
Chalmers University of Technology University of Göteborg, Sweden

Abstract

Optical properties of the GaNxAs1−x layers grown on (001) GaAs substrates by molecular beam epitaxy have been studied. The samples can be classified into three categories with respect to the concentration of N, as determined by x-ray diffraction and secondary-ion mass spectrometry: (i) with doping nitrogen concentration, (ii) with average content of N less than 30 %, and (iii) with x close to 100 %. From optical measurements of photoluminescence and Raman scattering, combined with analysis of x-ray diffraction spectra, different phases are observed in the GaNxAs1−x layers: GaAs, GaN and the solid ternary solution GaNxAs1−x. We have estimated the fundamental band-gap energy in the GaNxAs1−x alloy with low nitrogen concentration (up to x = 0.04) from absorption measurements, and in GaNxAs1−x with low arsenic concentration (up to 1−x = 0.04) - from photoluminescence spectra. An analysis of the dependence of the experimental values of the GaNxAs1−x band-gap energy on the nitrogen composition indicates a constant bowing parameter b as large as b = -18 eV.

Information

Type
Research Article
Copyright
Copyright © 1998 Materials Research Society
Figure 0

Figure 1. The XRD spectrum of the GaNxAs1−x sample with 1.85% nitrogen (a), and XRD spectra for two GaN(As) layers with low arsenic content of 0.3% and 4%, respectively (b).

Figure 1

Figure 2. The low temperature (T=2 K) photoluminescence spectrum in the infrared region for the GaAs:N sample with an isoelectronic nitrogen doping concentration of 1018 cm−3.

Figure 2

Figure 3. Typical defect emission band in the As-rich GaNxAs1−x-layers with an average nitrogen concentration of 6.6%.

Figure 3

Figure 4. The low temperature (T=2 K) photoluminescence in the ultraviolet region for an As-rich GaNxAs1−x layer with 8.6% average nitrogen concentration.

Figure 4

Figure 5. Photoluminescence measured at T = 2 K for two As-poor GaNxAs1−x layers with arsenic concentration of 0. 3% and 4%, respectively, (a), and a photoluminescence spectrum of the cubic GaN taken from Ref. 21 is shown for comparison (b).

Figure 5

Figure 6. Depolarized Raman spectrum measured at room temperature for an As-rich GaNxAs1−x layer with 8.6% average nitrogen concentration.

Figure 6

Figure 7. The band-gap energy of GaNxAs1−x as a function of nitrogen concentration. Experimental results are shown by the solid circles for absorption data and by the open circles for the PL measurements. The solid line is fitting of Eg using parabolic law with b = -18 eV (the part of the calculated curve in the inexperienced region of nitrogen concentrations is shown by the dashed line).