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Refitting an X-ray diffraction system for combined GIXRF and XRR measurements

Published online by Cambridge University Press:  01 July 2020

Dieter Ingerle*
Affiliation:
TU Wien, Atominstitut, Vienna 1020, Austria
Werner Artner
Affiliation:
TU Wien, X-Ray Center, Vienna 1060, Austria
Klaudia Hradil
Affiliation:
TU Wien, X-Ray Center, Vienna 1060, Austria
Christina Streli
Affiliation:
TU Wien, Atominstitut, Vienna 1020, Austria
*
a)Author to whom correspondence should be addressed. Electronic mail: dieter.ingerle@tuwien.ac.at

Abstract

A commercial Empyrean X-ray diffractometer was adapted for combined grazing incidence X-ray fluorescence analysis (GIXRF) measurements with X-ray reflectivity (XRR) measurements. An energy-dispersive silicon drift detector was mounted and integrated in the angle-dependent data acquisition of the Empyrean. Different monochromator/X-ray optics units have been compared with the values obtained by the Atominstitut GIXRF + XRR spectrometer. Data evaluation was performed by JGIXA, a special software for combined GIXRF + XRR data fitting, developed at Atominstitut. A sample consisting of a ~50 nm nickel layer on a silicon substrate was used to compare the performance criteria (i.e. divergence and intensity) of the incident beam optics. An Empyrean X-ray diffractometer was successfully refitted to measure both GIXRF and XRR data.

Information

Type
Proceedings Paper
Creative Commons
Creative Common License - CCCreative Common License - BY
This is an Open Access article, distributed under the terms of the Creative Commons Attribution licence (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted re-use, distribution, and reproduction in any medium, provided the original work is properly cited.
Copyright
Copyright © The Author(s), 2020. Published by Cambridge University Press on behalf of International Centre for Diffraction Data
Figure 0

Figure 1. Empyrean setup with the XRF detector (Amptek SDD).

Figure 1

Figure 2. Intensity of Si signal (left) and X-ray reflectivity intensity (right) versus angle of incidence for the various X-ray optics of the Empyrean diffractometer.

Figure 2

Figure 3. Intensity of Si signal (top) and X-ray reflectivity intensity (bottom) versus angle of incidence for the various X-ray optics of the Empyrean diffractometer. The angle range from 0.4 to 0.6° is plotted to emphasize the influence of the divergence of the used X-ray optics on specific features (marked with a circle). Additionally, the results from the ATI GIXRF + XRR spectrometer are given. The divergence values are the results of the fitting software JGIXA.

Figure 3

Figure 4. Intensity of S of an OLED model system with differently prepared host layer. (a) The actual measurement with the hybrid monochromator and a simulation with 0.25 mrad divergence; (b) simulations of the same sample models as in (a), but with 0.32 mrad divergence. The distinct steps in the curves, which are clearly visible in (a), are only slightly noticeable because of the increased divergence.