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Magneto-optical studies of shallow donors in MOCVD grown GaN layers in FIR

Published online by Cambridge University Press:  13 June 2014

A. M. Witowski
Affiliation:
Institute of Experimental Physics, Warsaw University Grenoble High Magnetic Field Laboratory MPI CNRS
M. L. Sadowski
Affiliation:
Institute of Experimental Physics, Warsaw University Grenoble High Magnetic Field Laboratory MPI CNRS
K. Paku ,a
Affiliation:
Institute of Experimental Physics, Warsaw University
B. Suchanek
Affiliation:
Institute of Experimental Physics, Warsaw University
R. Stepniewski
Affiliation:
Institute of Experimental Physics, Warsaw University
Jacek M. Baranowski
Affiliation:
Institute of Experimental Physics, Warsaw University
M. Potemski
Affiliation:
Grenoble High Magnetic Field Laboratory MPI CNRS
G. Martinez
Affiliation:
Grenoble High Magnetic Field Laboratory MPI CNRS
P. Wyder
Affiliation:
Grenoble High Magnetic Field Laboratory MPI CNRS

Abstract

Far infrared magnetooptical investigations of shallow donors in epitaxial MOCVD GaN layers show two types of shallow donors. In relaxed layers, a donor with an ionization energy of 35 meV was found. In strained, undoped and Si doped samples, a donor with ionization energy 32.5 meV was observed. From the p state splitting in magnetic field, the cyclotron effective mass for conduction electrons was found to be m*=0.222 m0.

Information

Type
Research Article
Copyright
Copyright © 1998 Materials Research Society
Figure 0

Figure 1. Temperature dependence of concentration and mobility for GaN epilayers grown on sapphire.

Figure 1

Figure 2. (top) Photocurrent for SAP 119 at different magnetic fields. (bottom) Position of PC lines vs. magnetic field. Lines represent theoretical calculations.

Figure 2

Figure 3. (top) Photocurrent for MAR 51 at different magnetic fields. (bottom) Position of PC lines vs. magnetic field. Lines represent theoretical calculations.