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Raman characterization of the optical phonons in AlxGa1−xN layers grown by MBE and MOCVD

Published online by Cambridge University Press:  13 June 2014

A. Cros
Affiliation:
Walter Schottky Institut, Technische Universität München and Dep. Física Aplicada, Univ. Valencia
H. Angerer
Affiliation:
Walter Schottky Institut, Technische Universität München
R. Handschuh
Affiliation:
Walter Schottky Institut, Technische Universität München
O. Ambacher
Affiliation:
Walter Schottky Institut, Technische Universität München
M. Stutzmann
Affiliation:
Walter Schottky Institut, Technische Universität München

Abstract

We present the results of Raman measurements performed on AlxGa1−xN layers grown by MBE and MOCVD. The films were deposited on (0001) c-sapphire substrates, and the aluminum content covered the whole composition range for x from 0 (GaN) to 1 (AlN). It is shown that the energies of both A1(TO) and A1(LO) phonon modes smoothly increase with increasing x, indicating a one-mode behavior. The E2 phonon mode, however, presents a different behavior. Its energy increases very slowly with aluminum content and, for x≈0.4, a new phonon mode shows up which is shifted to higher energies by 50 cm−1. This new line leads to the E2 AlN mode for increasing aluminum content. The linewidths and intensities of these modes strongly depend on composition. These results are compared with recent theoretical calculations. Finally, the Raman selection rules in the MBE and MOCVD samples are compared and conclusions about the quality of the layers are drawn.

Information

Type
Research Article
Copyright
Copyright © 1997 Materials Research Society
Figure 0

Figure 1. Room temperature Raman spectra of an AlxGa1−xN sample with a thickness of 3μm and an aluminum content of 50%. The polarization configuration used is indicated on each spectrum.

Figure 1

Figure 2a. Room temperature Raman spectra obtained for different AlxGa1−xN compositions. Spectral range showing (a) A1(TO) (green triangles) and E2 (red dots and black arrows) phonon modes. The dashed line indicates the position of the modes related to the sapphire substrate.

Figure 2

Figure 2b. Room temperature Raman spectra obtained for different AlxGa1−xN compositions. Spectral range showing A1(LO) phonon mode (blue triangles). The dashed line indicates the position of the modes related to the sapphire substrate.

Figure 3

Figure 3. Dependence of the frequencies of the A1(TO) (green triangles), E2 (red dots) and A1(LO) (blue triangles) phonon modes on alloy composition.

Figure 4

Figure 4. Room temperature Raman spectra of two AlxGa1−xN samples grown by MBE (black) and MOCVD (blue) with an aluminum content of 19%. The spectrum of a sample with only a GaN buffer layer grown by MOCVD (red line) has been included for comparison with the spectrum plotted in blue. The dashed line indicates the position of the sapphire Eg mode. The arrows indicate the A1(LO) phonon mode arising from the GaN buffer layer.

Figure 5

Figure 5. Dependence of the linewidths of the E2(GaN) (full dots) and E2(AlN) (empty dots) phonon modes on aluminum content for the MBE (red) and MOCVD (green) samples. The lines are drawn as guides to the eyes. The inset shows the relative intensities of the E2(GaN) and E2(AlN) phonon modes as a function of aluminum content