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Spectroscopic Studies in InGaN Quantum Wells

Published online by Cambridge University Press:  13 June 2014

S. F. Chichibu
Affiliation:
Materials and ECE Departments, University of California, Santa Barbara, CA 93106 Department of EE, Science University of Tokyo, 2641 Yamazaki, Noda, Chiba 278-8510, Japan, chichibu@rs.noda.sut.ac.jp
T. Sota
Affiliation:
EECE Department, Waseda University, 3-4-1 Ohkubo, Shinjuku, Tokyo 169-8555, Japan
K. Wada
Affiliation:
Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Ave., Cambridge, MA 02139
S. P. DenBaars
Affiliation:
Materials and ECE Departments, University of California, Santa Barbara, CA 93106
S. Nakamura
Affiliation:
Department of Research and Development, Nichia Chemical Industries Ltd., 491 Oka, Kaminaka, Anan, Tokushima 774-8601, Japan

Abstract

Fundamental electronic modulations in strained wurtzite III-nitride, in particular InxGa1−xN, quantum wells (QWs) were treated to explore the reason why practical InGaN devices emit bright luminescences in spite of the large threading dislocation (TD) density. The emission mechanisms were shown to vary depending on the well thickness L and InN molar fraction x. The electric field across the QW plane, F, which is a sum of the fields due to spontaneous and piezoelectric polarization and the pn junction field, causes the redshift of the ground state resonance energy through the quantum confined Stark effect (QCSE). The absorption spectrum is modulated by QCSE, quantum-confined Franz-Keldysh effect (QCFK), and Franz-Keldysh (FK) effect from the barrires when, for the first approximation, potential drop across the well (FL) exceeds the valence band discontinuity, EV. Under large FL, holes are confined in the triangular potential well formed at one side of the well. This produces apparent Stokes-like shift in addition to the in-plane net Stokes shift on the absorption spectrum. The QCFK and FK further modulate the electronic structure of the wells with L greater than the three dimensional (3D) free exciton (FE) Bohr radius, aB. When FL exceeds EC, both electron (e) and hole (h) confined levels drop into the triangular potential wells at opposite sides of the wells, which reduces the wavefunction overlap. Doping of Si in the barriers partially screens the F resulting in a smaller Stokes-like shift, shorter recombination decay time, and higher emission efficiency. Finally, the use of InGaN was found to overcome the field-induced oscillator strength lowering due to the spontaneous and piezoelectric polarization. Effective in-plane localization of the QW excitons (confined excitons, or quantized excitons) in quantum disk (Q-disk) size potential minima, which are produced by nonrandom alloy potential fluctuation enhanced by the large bowing parameter and F, produces confined e-h pairs whose wavefunctions are still overlapped when L<aB. Their Coulomb interaction is more pronounced for FL<EV.

Information

Type
Research Article
Copyright
Copyright © 1999 Materials Research Society
Figure 0

Fig.1 Schematic band diagrams of GaN/InGaN QWs under the electric field F. Each case represents the restrictions determined resonance energy slightly shifts to lower energy among F, L, EV, and aB.

Figure 1

Fig.2 Low excitation PL and PLE spectra at RT of In0.1Ga0.9N / GaN:Si MQWs for different well thickness, L. The apparent bandgap is defined as the energy where the PLE signal intensity drops to half the maximum.

Figure 2

Fig.3 High and low excitation PL peak energies, apparent bandgap energy estimated from PLE spectra, and apparent Stokes-like shift of In0.1Ga0.9N wells at RT as a function of L.

Figure 3

Fig.4 Quantized energy levels and wavefunctions of e-h pair in In0.1Ga0.9N SQW under the condition of F=400kV/cm.

Figure 4

Fig.5 Low excitation PL and PLE spectra at 10 K of 3-nm-thick InxGa1−xN / GaN:Si SQW structures with different InN molar fraction, x. The x values are estimated assuming coherent growth.

Figure 5

Fig.6 Quantized energy levels and wavefunctions of e−h pair in 3-nm-thick InGaN SQW under the condition of F=100kV/cm (x=0.03) and 400kV/cm (x=0.1).

Figure 6

Fig.7 PL FWHM, apparent Stokes-like shift, and TR-PL decay time of 3-nm-thick InxGa1−xN QWs as a function of x.

Figure 7

Fig.8 Quantized energy levels and wavefunctions of e-h pair in 3-nm-thick InGaN SQW under the condition of F=0kV/cm, F=500kV/cm, and F=500kV/cm and Ne−h pair =4 1012cm−2.

Figure 8

Fig.9 Low-excitation PL and PLE spectra at 300 K of In0.13Ga0.87N/GaN MQWs for different Si-doping concentrations (n). PLE edge was sharpened and the PL peak blueshifted with increasing n.

Figure 9

Fig. 10 Optical transmittance and high excitation PL spectra at 10 K and RT of a 5-nm-thick GaN / Al0.15Ga0.85N DH structure grown on thick Al0.3Ga0.7N base layer and those of 5.5-nm-thick InGaN / Al0.1Ga0.9N DH structure (SQW UV-LED)49 grown on thick GaN base.

Figure 10

Fig.11 Wide-area (10 m 10 m) scanning and spot excitation CL spectra of 3-nm-thick In0.1Ga0.9N SQW capped by a 6-nm-thick GaN. The broad CL peak (FWHM=100 meV) consists of several sharp emission peaks (FWHM=20 meV) having different peak energies. Monochromatic CL images taken at 400 and 420 nm showed primarily the complimentary relation. The resolution of the CL mapping is limited by the diffusion length, which was nearly 60 nm in lateral direction.

Figure 11

Fig. 12 PL and PLE spectra at 10 K obtained from InGaN SQW and MQW structures grown on LEO window and LEO wing regions.

Figure 12

Fig. 13 Time-integrated PL spectra and the decay time as a function of emission energy at RT of InGaN MQW grown on the LEO wing.