We investigated the fabrication of diamond-like carbon (DLC) emitter patterns byroom-temperature curing nanoimprint lithography (RTC-NIL) withpolydimethylsiloxane (PDMS) molds using polysiloxane, as an application to theemitter for the next generation flat panel display.
The DLC which has excellent properties similar to diamond properties was used asa pattern material. A PDMS was used as a mold material and fabricated by thefollowing optimum conditions of the first curing time at RT for 36 h and thesecond curing time at the temperature of 150 °C for 15 mins. Thepolysiloxane is in the state of sticky liquid at RT and stable in air.Therefore, the polysiloxane was used the electron beam (EB) resist and oxidemask material in EB lithography, and also used as RT-imprint material.
First, we fabricated the PDMS mold with pit array. Each dot is 5µm-diameter and 400 nm-depth. We carried out the RTC-NIL process withPDMS molds using polysiloxane under the following optimum imprint conditions of0.5 MPa-imprinting pressure, 1.5 min-the time between spin-coat and imprint, and5 min-imprinting time. Next, the residual layer of imprinted polysiloxanepattern was 450 nm and then was removed with electron cyclotron resonance (ECR)trifluoromethane (CHF3) ion shower under the conditions of 300 eV-ionenergy and 3 min-etching time. Then, we processed the imprinted polysiloxanepatterns on the DLC film with an ECR oxygen (O2) ion shower under theconditions of 400 eV-ion energy and 12 min-etching time. As a result, wesucceeded in fabricating convex DLC emitter patterns with high accuracy whichhas 5 µm-diameter and 500 nm-height.