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Radiative recombination in In0.15Ga0.85N/GaN multiple quantum well structures

Published online by Cambridge University Press:  13 June 2014

B. Monemar
Affiliation:
Department of Physics and Measurement Technology, Linköping University
J. P. Bergman
Affiliation:
Department of Physics and Measurement Technology, Linköping University
J. Dalfors
Affiliation:
Department of Physics and Measurement Technology, Linköping University
G. Pozina
Affiliation:
Department of Physics and Measurement Technology, Linköping University
B.E. Sernelius
Affiliation:
Department of Physics and Measurement Technology, Linköping University
P.O. Holtz
Affiliation:
Department of Physics and Measurement Technology, Linköping University
H. Amano
Affiliation:
Department of Electrical and Electronic Engineering, Meijo University High-Tech Research Center, Meijo University
I. Akasaki
Affiliation:
Department of Electrical and Electronic Engineering, Meijo University High-Tech Research Center, Meijo University

Abstract

We present a study of the radiative recombination in In0.15Ga0.85N/GaN multiple quantum well samples, where the conditions of growth of the InGaN quantum layers were varied in terms of growth temperature (< 800 °C) and donor doping. The photoluminescence peak position varies strongly (over a range as large as 0.3 eV) with delay time after pulsed excitation, but also with donor doping and with excitation intensity. The peak position is mainly determined by the Stark effect induced by the piezoelectric field. In addition potential fluctuations, originating from segregation effects in the InGaN material, from interface roughness, and the strain fluctuations related to these phenomena, play an important role, and largely determine the width of the emission. These potential fluctuations may be as large as 0.2 eV in the present samples, and appear to be important for all studied growth temperatures for the InGaN layers. Screening effects from donor electrons and excited electron-hole pairs are important, and account for a large part of the spectral shift with donor doping (an upward shift of the photoluminescence peak up to 0.2 eV is observed for a Si donor density of 2 × 1018 cm−3 in the well), with excitation intensity and with delay time after pulsed excitation (also shifts up to 0.2 eV). We suggest a two-dimensional model for electron- and donor screening in this case, which is in reasonable agreement with the observed data, if rather strong localization potentials of short range (of the order 100 Å) are present. The possibility that excitons as well as shallow donors are impact ionized by electrons in the rather strong lateral potential fluctuations present at this In composition is discussed

Information

Type
Research Article
Copyright
Copyright © 1999 Materials Research Society
Figure 0

Figure 1. Schematic picture of the multiple quantum well sample structure used for this work.

Figure 1

Figure 2a. Photoluminescence topograph at 300K of the total emission from an InGaN/GaN MQW sample with the InGaN growth temperature 700 °C. Note that the laser spot has a Gaussian intensity profil. Intensity fluctuations on a length scale of a few μm are observed.

Figure 2

Figure 2b. The same type of data at 300 K for an InGaN/GaN MQW sample with the InGaN growth temperature at 780 °C. The length scale of intensity fluctuations is now smaller, but still resolved

Figure 3

Figure 2c. Monochromatic cathodoluminescence topograph at 6 K from an InGaN/GaN MQW sample with the InGaN growth temperature at 700 °C. Again intensity fluctuations over a length scale of about 1 μm are observed.

Figure 4

Figure 3. Stationary PL spectra at 2 K of two coherently strained thick In0.15Ga0.85N epilayers grown on sapphire at the temperatures indicated: (a) left panel, 700 °C, (0.06 μm thick layer) (b) right panel, 780 °C (0.10 μm thick layer). Note that the presence of a spectral contribution at lower photon energies in (b) indicates some segregation.

Figure 5

Figure 3c. In (c) are shown two PLE spectra for the same sample as in (b), detected at two different photon energies. The PL spectrum obtained with low intensity lamp excitation is also shown.

Figure 6

Figure 4. PL transient response at 2 K of the PL peak for the sample in Figure 3 (a). Note the welldefined radiative lifetime of 0.85 ns.

Figure 7

Figure 5. Stationary PL spectra as well as PLE spectra at 2 K of two coherently strained and nominally undoped In0.15Ga0.85N/GaN MQWs grown on sapphire with the InGaN layer growth temperatures indicated: (a) left panel, 700 °C, (b) right panel, 780 °C. The spectra are obtained with low intensity excitation employing a Xe lamp. The PL signal at lower photon energies is very weak in both cases. The PLE spectra are obtained with detection at the peak of the PL signal.

Figure 8

Figure 5c. In Fig 5 (c) is shown the dependence of the peak position on the excitation intensity for the same sample as in 5 (b).

Figure 9

Figure 6. Stationary PL spectra at 2 K of three coherently strained In0.15Ga0.85N/GaN MQWs grown on sapphire at 700 °C. Sample 1 is nominally undoped, but has a background Si donor doping of about 1 × 1017 cm−3 in the well. The other two samples are Si-doped in the wells, to a density of about 4 × 1017 cm−3 for sample 2 and about 2 × 1018 cm−3 for sample 3. The GaN barriers are not Si-doped.

Figure 10

Figure 7. Streak camera panel at 2 K for the same MQW sample as in Figure 5 (a), obtained with fs pulse excitation at about 3.2 eV. Each transient is marked with the corresponding PL emission wavelength (in Å units). Note the short rise time across the whole broad PL spectrum.

Figure 11

Figure 8. Timeresolved PL spectra for two MQW samples obtained at 2 K with excitation at 3.6 eV. The time interval between each spectrum is 0.8 ns. In (a) left panel, are shown spectra for the undoped sample D1 in Figure 6, and in (b) right panel, are shown corresponding data for the doped sample D3 in Figure 6. Note the strong spectral shift between the two samples.

Figure 12

Figure 9. Decay curves at different photon energies within the broad PL peak, obtained at 2 K with excitation at 3.2 eV for the same MQW samples at in Figure 5 (b). In (a) left panel, is shown the intermediate time regime, on the right panel (b) is shown the long time behavior.

Figure 13

Figure 10. Timeresolved PL spectra for an MQW sample with the InGaN layer grown at 700 °C, obtained at 2 K, left panel (a) and at 300 K, right panel (b), respectively, and with excitation at 3.2 eV. The 300 K spectra are broadened towards higher energy, and also have shorter decay time.

Figure 14

Figure 11. Effective decay times for the same two MQW samples as in Figure 5 (a), left panel, and (b), right panel, respectively. The data are shown for 3 different measurement temperatures, 2K, 100 K, and 300 K, and for a number of different wavelengths across the broad PL emission. The excitation wavelength is about 3.2 eV.

Figure 15

Figure 12. (a). The screening effect on a gaussian potential of width 100 Å in one of the quantum wells. The dotted curve is the bare potential. The dash-dotted, dashed, full and dash-triple-dotted curves are for the carrier concentrations 2×1017 cm−3, 4×1017 cm−3, 2×1018 cm−3 and 1×1019 cm−3, respectively. All curves have been scaled to the value at the center of the unscreened potential. We have plotted the potentials with reverted sign to get the impression of a potential well. The screened potentials have Friedel oscillations at large separations. (b). The well depths of screened gaussian potentials for different carrier concentrations, indicated in the figure, as functions of potential width.