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Temperature-Composition Dependence of the Bandgap and Possible Non-complanar Structures in GaN-AlN, GaN-InN and InN-AlN Mixed Crystals

Published online by Cambridge University Press:  13 June 2014

E. V. Kalashnikov
Affiliation:
Institute of Mechanical Engineering, RAN
V. I. Nikolaev
Affiliation:
Ioffe Physical-Technical Institute

Abstract

The virtual crystal approximation has been used to determine the temperature-composition dependence of the GaN-AlN, GaN-InN, and InN-AlN band gap energies. Also, the thermodynamic instability states in the mixed crystals were studied. The expression for the band gap of mixed A-B crystals has been derived: Eg AB = (1−x)Eg A + xEg B − bSxx, where Eg A and Eg B are the direct gaps for compounds A and B, respectively, and x is the alloy concentration. The term Sxx ~ T0/(∂2G/∂x2) where G is the thermodynamic potential of the mixed crystal, b is a bowing parameter, and T0 has the meaning of a growth temperature.

Information

Type
Research Article
Copyright
Copyright © 1997 Materials Research Society
Figure 0

Figure 1. Temperature-composition diagrams for the regular solution and examples of the space structures. F(x) is the compositional variation of the free energy at T3 < Tc. The curves 1 and 2 are the binodal and the spinodal respectively. Curve 3 schematically shows the space periodical structure at T3 in the labile (L) states of the solution (the area of lability is under the spinodal). Curve 4 demonstrates the space relaxation structure in the region of metastable (M) states of the solutions (between curves 1 and 2). S marks the area, where the solution is stable.

Figure 1

Figure 2. Compositional dependence of Sxx at various temperature.

Figure 2

Table 1 Figure 1. Bowing parameters and critical temperatures for nitride semiconductors.

Figure 3

Figure 3. Variation of the direct energy band gap Eg with x for InxGa1−xN at room temperature. The curves show Eg(x) calculated from (2) at various “growth” temperatures. The dashed line marks the range where term Eg loses its ordinary meaning. The symbols are experimental data: (*) represents Eg of the polycrystalline alloys grown by electron beam plasma technique from mixtures of Ga and In (Osamura et al. [6]); (Δ) and (open squares) represent Eg of high quality single crystal layers grown at the temperature from the range 1050-1100 K and LEDs (Nakamura et al. [1][2][17]); (red diamonds) represent Eg of the single crystal alloys grown by MOVPE at about 770 K (Nagatomo et al. [15]).

Figure 4

Table 2 Growth techniques, technological temperatures and experimental procedure for nitride alloy research. EPMA is electron probe microanalysis; PL, EL are photo- and electroluminecsence, respectively.

Figure 5

Figure 4. Variation of room temperature Eg(x) for InxAl1−xN alloys grown at temperature T0 = 800 K. The curve represents the calculated dependence of Eg(x), the dashed line marks the range where the Eg(x) is not uniquely determined. The dots show the data from [3].

Figure 6

Figure 5. The compositional dependence of the band gap in AlxGa1−xN alloys at 77 K and 300 K. The curves are calculated from (2) for alloys grown at 1300 K. The solid curve is Eg(x) at room temperature and the dashed curve is Eg(x) at 77 K. The circles represent experimental data; the filled circles from [4], open from [7], both at the room temperature; and crossed out circles are experimental values of Eg at 77 K [16].