Hostname: page-component-76fb5796d-2lccl Total loading time: 0 Render date: 2024-04-26T06:21:30.943Z Has data issue: false hasContentIssue false

UV/ozone Surface Modification for Long-term Stable Hydrophilic Surface of Polymer Microfluidic Devices

Published online by Cambridge University Press:  26 February 2016

Shogo Uehara*
Affiliation:
SAMCO Inc., 1227 Innsbruck Drive, Sunnyvale, CA 94089, U.S.A.
Tsukasa Kawabe
Affiliation:
SAMCO Inc., 1227 Innsbruck Drive, Sunnyvale, CA 94089, U.S.A.
Peter Wood
Affiliation:
SAMCO Inc., 1227 Innsbruck Drive, Sunnyvale, CA 94089, U.S.A.
Osamu Tsuji
Affiliation:
SAMCO Inc., 36 Waraya-cho, Takeda, Fushimi-ku, Kyoto, 612-8443, Japan
Get access

Abstract

Faster and more effective surface modification processes of polymer materials by UV/ozone treatment were investigated. The employment of ex-situ generated ozone and/or temperature control contributed to the faster and more effective modification. The UV/ozone treatment showed long-term stable hydrophilic surfaces for 6 months, in contrast to oxygen plasma treatment, which showed hydrophobic recovery. XPS analysis revealed that UV/ozone treatment with ex-situ generated ozone and temperature control added ester (-COOR) on COP sample compared to UV/ozone treatment without the additional ozone and temperature control.

Type
Articles
Copyright
Copyright © Materials Research Society 2016 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Zhou, J., Ellis, A.V. and Voelcker, N. H., Electrophoresis, 31, 216 (2010).CrossRefGoogle Scholar
Kitsara, M. and Ducrée, J., J. Micromech. Microeng. 23 (2013).CrossRefGoogle Scholar
Bodas, D. and Khan-Malek, C., Sensors and Actuators B: Chemical, 123, 368373 (2007).CrossRefGoogle Scholar
Berdichevsky, Y., Khandurina, J., Guttman, A. and Lo, Y-H., Sensors and Actuators B: Chemical, 97, 402408 (2004).CrossRefGoogle Scholar
Wood, P.C., Wydeven, T. and Tsujiin, O.Surface Chemical Cleaning and Passivation for Semiconductor Processing, edited by Higashi, G.S., Irene, E.A., and Ohmi, T., (Mater. Res. Soc.Symp. Proc. 315 , Pittsburgh, PA, 1993) pp. 237242.CrossRefGoogle Scholar
Romero-Sánchez, M. D., Pastor-Blas, M. M., Martín-Martínez, J. M. and Walzak, M. J., International Journal of Adhesion and Adhesives. 25, 358370 (2005).CrossRefGoogle Scholar
van Midwoud, P. M., Jense, A., Merema, M. T., Groothuis, G. M. M. and Verpoorte, E., Anal. Chem. 84, 39383944 (2012).CrossRefGoogle Scholar
Tsao, C.W., Hromada, L., Liu, J., Kumar, P. and DeVoe, D.L., Lab Chip. 7, 499505 (2007).CrossRefGoogle Scholar
Mathieson, I. and Bradley, R.H., J. Matter.Chem. 4, 1157–1157 (1994).CrossRefGoogle Scholar