Periodic 2-dimensional (2-D) hexagonal and the disordered pore structuresilica films have been developed using nonionic surfactants as thetemplates. The pore structure was controlled by the static electricalinteraction between the micelle of the surfactant and the silica oligomer.No X-ray diffraction peaks were observed for the disordered mesoporoussilica films, while the pore diameters of 2.0-4.0 nm could be measured bysmall angle X-ray scattering spectroscopy. By comparing the properties ofthe 2-D hexagonal and the disordered porous silica films which have the sameporosity, it is found that the disordered porous silica film has advantagesin terms of the dielectric constant and Young's modulus as well as thehardness. The disordered porous silica film is more suitable for theinterlayer dielectrics for ULSI.