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The Field Emission Gun Scanning Electron Microscopehigh Resolution at Low Beam Energies

Published online by Cambridge University Press:  21 February 2011

David C Joy
David C Joy*
Affiliation:
EM Facility, University of Tennessee, Knoxville, TN 37996-0810 and Metals and Ceramics Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831
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Abstract

The scanning electron microscope (SEM) is the most widely used, as well as the most versatile, of electron-optical instruments. In all of the imaging modes of the instrument it is now possible to achieve a spatial resolution on the nanometer scale from a bulk specimen, provided that the electron-optical performance of the instrument is of the necessary quality. In practice this means that a field emission gun (FEG) as well as a highly excited probe forming lens must be used. With state-of-the-art instrumentation, image resolutions as good as 4 - 5 nm at lkeV, and lnm at 20keV, are now achievable. This paper outlines the design criteria for a high resolution FEG SEM and discusses the type of image information available. The performance achieved is compared to that of other types of microscope that offer similar capabilities.

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