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Technetium Removal Processes for Soluble Defense High-Level Waste

Published online by Cambridge University Press:  26 February 2011

Darrel D. Walker
Affiliation:
E. I. du Pont de Nemours and Company Savannah River Laboratory Aiken, South Carolina 29808
Jane P. Bibler
Affiliation:
E. I. du Pont de Nemours and Company Savannah River Laboratory Aiken, South Carolina 29808
Richard M. Wallace
Affiliation:
E. I. du Pont de Nemours and Company Savannah River Laboratory Aiken, South Carolina 29808
Martha A. Ebra
Affiliation:
E. I. du Pont de Nemours and Company Savannah River Laboratory Aiken, South Carolina 29808
John P. Ryan Jr
Affiliation:
E. I. du Pont de Nemours and Company Savannah River Laboratory Aiken, South Carolina 29808
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Abstract

Two methods for removing technetium from soluble defense high-level waste are described. In the first method, technetium is precipitated as tetraphenylphosphonium pertechnetate and separated from the decontaminated solution using sintered metal crossflow filters. In the second method, pertechnetate is removed from solution using a strong base anion exchange resin and then eluted from the resin with nitric acid. The nitric acid is recovered by sorption of the pertechnetate on a weak base ion exchange resin. The pertechnetate is eluted from the weak base resin with NaOH and recovered by precipitation as the sulfide or oxide.

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Type
Research Article
Copyright
Copyright © Materials Research Society 1985

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